采用脉冲激光沉积(PLD)技术,在不同环境压强下于室温Si衬底上沉积制备出了Ge纳米薄膜.用X射线衍射仪(XRD)和扫描电子显微镜(SEM)研究了环境压强对薄膜的微观结构、形貌以及膜厚的影响规律.结果表明:所制备的纳米薄膜中Ge均为晶态;随着环境压强的增大,薄膜表面由常规的量子点镶嵌结构演变为类网状结构;膜厚随着环境压强的增大而减小.
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