非对称双极脉冲反应磁控溅射制备TiN/NbN多层膜

材料工程, 2012, (7): 92-96. doi: 10.3969/j.issn.1001-4381.2012.07.019

非对称双极脉冲反应磁控溅射制备TiN/NbN多层膜

黑立富 ^1, , 徐俊波 ^2, , 陈良贤 ^3, , 李成明 ^4, , 吕反修 ^5,

1.北京科技大学材料科学与工程学院,北京100083

2.北京科技大学材料科学与工程学院,北京100083

3.北京科技大学材料科学与工程学院,北京100083

4.北京科技大学材料科学与工程学院,北京100083

5.北京科技大学材料科学与工程学院,北京100083

基金项目: 国家自然科学基金(51102013)

关键词：纳米多层膜 , 力学性能 , 调制周期

TiN/NbN Multilayers Prepared by Asymmetrical Bipolarpulsed Reactive Magnetron Sputtering

采用非对称双极脉冲磁控溅射制备了一系列不同调制周期的TiN /NbN纳米多层膜,利用X射线衍射分析(XRD)、纳米压痕仪、扫描电子显微镜(SEM)表征了薄膜的微观结构、力学性能和断口形貌.结果表明,在调制周期为19.86nm时,纳米压痕硬度达到43GPa.利用三点弯曲法形成裂纹的扩展,并观察到了裂纹的偏转特征.

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材料期刊网

非对称双极脉冲反应磁控溅射制备TiN/NbN多层膜

TiN/NbN Multilayers Prepared by Asymmetrical Bipolarpulsed Reactive Magnetron Sputtering

参考文献