欢迎登录材料期刊网

材料期刊网

高级检索

选用AlCl3-NaCl-KCl作为电解液,铝硅合金作为阳极、不锈钢作为阴极,恒电流电解条件下实现了多晶硅精炼提纯中硅铝合金的低温分离.结合扫描电子显微镜、X射线衍射仪等检测手段,研究电解温度、电流密度、电解时间等实验参数对电流效率、沉积铝形貌的影响.研究结果表明:在电流密度为50mA/cm2,电解温度200℃,电解时间60min的条件下,Si-50% Al(质量分数,下同)阳极合金经阳极腐蚀后,阴极电极效率达到最大值93.7%,富硅阳极泥中含有90.4%的多晶硅.

参考文献

[1] CANIZO C D;COSO G D;LUQUE A et al.Ultrapurification of silicon for photovoltaic applications[J].Advances in Science and Technology,2010,74:99-106.
[2] 谭毅,郭校亮,石爽,董伟,姜大川,李佳艳.冶金法制备太阳能级多晶硅研究现状及发展趋势[J].材料工程,2013(03):90-96.
[3] 谭毅,孙世海,董伟,邢其智,冀明.多晶硅定向凝固过程中固-液界面特性研究[J].材料工程,2012(08):33-38.
[4] OBINATA I;KOMATSU N .Method of refining silicon by alloying[R].Science Reports of the Research Institutes,Tohoku University Ser A,Physics,Chemistry and Metallurgy,1957.
[5] Takeshi Yoshikawa;Kazuki Morita .Removal of phosphorus by the solidification refining with Si-Al melts[J].Science and technology of advanced materials,2003(6):531-537.
[6] DAWLESS R K .Boron removal in silicon purification patent[P].USA Patent:4312848,1982.
[7] Refining of silicon during its solidification from a Si-Al melt[J].Journal of Crystal Growth,2009(3):776.
[8] YOSHIKAWA T;MORITA K.Thermodynamics on the solidifi cation refining of silicon with Si-Al melts[A].San Francisco CA,2005
[9] JUNEJA J M;MUKHERJEE T K .A study of the purification of metallurgical grade silicon[J].Hydrometallurgy,1986,16(01):69-75.
[10] TEJEDOR P;OLSON J M .Silicon purification by the van Arkel-DE boer technique using a Cu3Si:Si composite ahoy source[J].Journal of Crystal Growth,1988,89(2-3):220-226.
[11] Aleksandar M. Mitrasinovic;Torstein A. Utigard .Refining Silicon for Solar Cell Application by Copper Alloying[J].Silicon,2009(4):239–248.
[12] DAWLESS R K .Silicon purification method using copper or copper-aluminum solvent metal patent[P].USA Patent:4822585,1989.
[13] 赵立新,王志,郭占成,李成义.低温净化冶金硅工艺[J].中国有色金属学报(英文版),2011(05):1185-1192.
[14] ESFAHANI S .Solvent refining of metallurgical grade silicon using iron[D].Toronto:University of Toronto,2010.
[15] GUMASTE J L;MOHANTY B C;GALGALI R K et al.Solvent refining of metallurgical grade silicon[J].Solar Energy Materials,1987,16(04):289-296.
[16] Xin Gu;Xuegong Yu;Deren Yang .Low-cost solar grade silicon purification process with Al-Si system using a powder metallurgy technique[J].Separation and Purification Technology,2011(1):33-39.
[17] YOSHIKAWA T;MORITA K .Continuous solidification of Si from Si-Al melt under the induction heating[J].ISIJ International,2008,47(04):582-584.
[18] 邱竹贤.冶金学[M].沈阳:东北大学出版社,2001
[19] 李景升,杨占红,王小花,李旺兴,陈建华,王升威,李景威.AlCl3-NaCl-KCl熔融盐中铝的电沉积[J].中南大学学报(自然科学版),2008(04):672-676.
[20] M. JAFARIAN;M. G. MAHJANI;F. GOBAL .Electrodeposition of aluminum from molten AlCl_3-NaCl-KCl mixture[J].Journal of Applied Electrochemistry,2006(10):1169-1173.
[21] ZHAO Y G;VANDERNOOT T J .Review:electrodeposition of aluminum from nonaqueous organic electrolytic systems and room temperature molten salts[J].Electrochimica Acta,1997,42(01):3-13.
[22] CAPUANO G A;DUCASSE R;DAVENPORT W G .Electrodeposition of aluminium-copper alloys from alkyl benzene electrolytes[J].Journal of Applied Electrochemistry,1979,9(01):7-13.
[23] Jiang T;Brym MJC;Dube G;Lasia A;Brisard GM .Electrodeposition of aluminium from ionic liquids: Part I - electrodeposition and surface morphology of aluminium from aluminium chloride (AlCl3)-l-ethyl-3-methylimidazolium chloride ([EMIm]Cl) ionic liquids[J].Surface & Coatings Technology,2006(1/2):1-9.
[24] Jiang T;Brym MJC;Dube G;Lasia A;Brisard GM .Electrodeposition of aluminium from ionic liquids: Part II - studies on the electrodeposition of aluminum from aluminum chloride (AICl(3)) - trimethylphenylammonium chloride (TMPAC) ionic liquids[J].Surface & Coatings Technology,2006(1/2):10-18.
[25] D. Pradhan;D. Mantha;R. G. Reddy .The effect of electrode surface modification and cathode overpotential on deposit characteristics in aluminum electrorefining using EMIC-AlCl_3 ionic liquid electrolyte[J].Electrochimica Acta,2009(26):6661-6667.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%