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利用直流脉冲电场下产生的非平衡等离子态的氢对CuO进行了强化还原实验,考察等离子体的固有化学特性对还原过程的影响.在体系压力450Pa、温度200℃的条件下,分子态的氢不能还原CuO,而等离子态的氢可还原CuO得到金属Cu.随着还原时间的增加,等离子态的氢还原CuO得到金属Cu层厚度的变化随着试样放置方式的不同呈现不同的规律,等离子体鞘层的变化对还原速率有很重要的影响.还原层厚度随时间的变化可以分为三个阶段,前两个阶段的反应速率主要受制于到达氧化物表面氢活性粒子流的通量,活泼的等离子体氢在反应产物层向反应界面的扩散是第三阶段的速率限制性环节.

参考文献

[1] Lide D R.CRC Handbook of Chemistry and Physics[M].London:Chemicl Rubbeer corp,1995
[2] Dembovsky V .Steel refining by chemically active plasma[J].Journal of Materials Prooessing Technology,1998,78(01):34-42.
[3] Alemany C.;Trassy C.;Pateyron B.;Li KI.;Delannoy Y. .Refining of metallurgical-grade silicon by inductive plasma[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2002(1/4):41-48.
[4] Mimura K;Lee S W;lsshiki M .Removal of alloying elements from zirconium alloys by hydrogen plasma-are molting[J].Journal of Alloys and Compounds,1995,221(04):267-273.
[5] Kitamura T;Shibata K;Takeda K .In-flight Reduction of Fe2O3,Cr2O3,TiO2 and Al2O3 by Ar-H2 and Ar-CH4 Plasma[J].ISIJ International,1993,33(11):1150-1158.
[6] Palmer RA.;Doan TM.;Lloyd PG.;Jarvis BL.;Ahmed NU. .Reduction of TiO2 with hydrogen plasma[J].Plasma Chemistry and Plasma Processing,2002(3):335-350.
[7] Takayuki Watanabe;Makoto Soyama;Atsushi Kanzawa;Akihiro Takeuchi;Mamoru Koike .Reduction and separation of silica-alumina mixture with argon-hydrogen thermal plasmas[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(1):161-166.
[8] 孙康.宏观反应动力学极其解析方法[M].北京:冶金工业出版社,1998
[9] 张玉文,丁伟中,郭曙强,徐匡迪.等离子态氢还原金属氧化物初探[J].中国有色金属学报,2004(02):317-321.
[10] Roine A.Outokumpu HSC Chemistry for Windows:Chemical Reaction and Equilibrium Software with Extensive Thermochemical Database[M].Pori,Finland:Outokumpu,1999
[11] Bulland D E;Lynch D C .Reduction of Titanium Dioxide in a Nonequilibrium Hydrogen Plasma[J].Metallurgical and Materials Transactions B:Process Metallurgy and Materials Processing Science,1997,28B(06):1069-1080.
[12] A Bogaerts;Neyts E;Gijbels R et al.Cas discharge plasma and their applications[J].Spectrochimica Acta,2002,57B:609-658.
[13] ZHANG Yu-wen,DING Wei-zhong,LU Xiong-gang,GUO Shu-qiang,XU Kuang-di.Reduction of TiO2 with hydrogen cold plasma in DC pulsed glow discharge[J].中国有色金属学会会刊(英文版),2005(03):594-599.
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