在室温下,采用直流磁控溅射法,以载玻片作为衬底,淀积出ZnO薄膜.在常压H2气氛中,以不同温度对样品进行退火处理.结果表明,在退火温度为500℃时,样品具有最佳综合光电性能,其在360～960nm波长范围内的平均透光率为76.35％,方块电阻为6.3kΩ/□.
参考文献
| [1] | 姜辛;孙超;洪瑞江.透明导电氧化物薄膜[M].北京:高等教育出版社,2008 |
| [2] | 丁萍,潘新花,叶志镇.Sb掺杂ZnO薄膜电学、光学性能研究[J].重庆理工大学学报（自然科学版）,2010(05):50-53. |
| [3] | Zi-Neng Ng;Kah-Yoong Chan;Thanaporn Tohsophon .Effects of annealing temperature on ZnO and AZO films prepared by sol-gel technique[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2012(24):9604-9609. |
| [4] | Kaneva, N.;Stambolova, I.;Blaskov, V.;Dimitriev, Y.;Bojinova, A.;Dushkin, C..A comparative study on the photocatalytic efficiency of ZnO thin films prepared by spray pyrolysis and sol-gel method[J].Surface & Coatings Technology,2012:5-10. |
| [5] | Linhua Xu;Xiangyin Li;Yulin Chen;Fei Xu .Structural and optical properties of ZnO thin films prepared by sol-gel method with different thickness[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2011(9):4031-4037. |
| [6] | Venkatachalam, S;Kanno, Y .Preparation and characterization of nano and microcrystalline ZnO thin films by PLD[J].Current applied physics: the official journal of the Korean Physical Society,2009(6):1232-1236. |
| [7] | Wang Yunfei;Chen Xuekang;Wang Lanxi et al.Properties of ZnO thin film on Al2O3 substrate prepared by pulsed laser deposition under different substrate temperature[J].Physics Procedia,2011,18:85-90. |
| [8] | Aya Morita;Ikuo Watanabe;Hajime Shirai .Chemical activity of oxygen atoms in the magnetron sputter-deposited ZnO films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2011(20):6903-6909. |
| [9] | Hoon J W;Chan K Y;Krishnasamy J et al.Direct current magnetron sputter-deposited ZnO thin films[J].Applied Surface Science,2011,257(07):2508-2515. |
| [10] | S. Mukhtar;A. Asadov;W. Gao .Microstructure of ZnO thin films produced by magnetron sputter oblique deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2012(9):3453-3457. |
| [11] | C.Besleaga;G.E. Stan;A.C.Galca;L. Ion;S. Antohe .Double layer structure of ZnO thin films deposited by RF-magnetron sputtering on glass substrate[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2012(22):8819-8824. |
| [12] | Sheng Chu;Muhammad Morshed;Lin Li;Jian Huang;Jianlin Liu .Smooth surface, low electron concentration, and high mobility ZnO films on c-plane sapphire[J].Journal of Crystal Growth,2011(1):36-40. |
| [13] | Yang Guangtao;Zhang Guobin;Zhou Hongjun;Qi Zeming .Synchrotron radiation assistant MOCVD deposition of ZnO films on Si substrate[J].Applied Surface Science,2009(17):7695-7699. |
| [14] | Kim, J.;Kim, M.-C.;Yu, J.;Park, K. .H_2/Ar and vacuum annealing effect of ZnO thin films deposited by RF magnetron sputtering system[J].Current applied physics: the official journal of the Korean Physical Society,2010(Suppl.3):S495-S498. |
| [15] | J.W.Shin;Y.S.No;J.Y.Lee;J.Y.Kim;W.K.Choi;T.W.Kim .Effects of different annealing atmospheres on the surface and microstructural properties of ZnO thin films grown on p-Si (100) substrates[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2011(17):7516-7520. |
| [16] | Yoon, S.;Huh, I.;Lim, J.-H.;Yoo, B. .Annealing effects on electrical and optical properties of ZnO thin films synthesized by the electrochemical method[J].Current applied physics: the official journal of the Korean Physical Society,2012(3):784-788. |
| [17] | Lin Cui;Hua-Yu Zhang;Gui-Gen Wang;Fang-Xu Yang;Xu-Ping Kuang;Rui Sun;Jie-Cai Han .Effect of annealing temperature and annealing atmosphere on the structure and optical properties of ZnO thin films on sapphire (0001) substrates by magnetron sputtering[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2012(7):2479-2485. |
| [18] | Husna J;Aliyu M M;Islam M A et al.Influence of annealing temperature on the properties of ZnO thin films grown by sputtering[J].Energy Procedia,2012,25:55-61. |
| [19] | 李伙全,曾祥华,韩玖荣.射频磁控溅射沉积高质量ZnO薄膜的工艺研究[J].功能材料,2012(05):677-680. |
| [20] | Daniel, GP;Justinvictor, VB;Nair, PB;Joy, K;Koshy, P;Thomas, PV .Effect of annealing temperature on the structural and optical properties of ZnO thin films prepared by RF magnetron sputtering[J].Physica, B. Condensed Matter,2010(7):1782-1786. |
| [21] | Chul-Hwan Choi;Seon-Hyo Kim .Effects of post-annealing temperature on structural, optical, and electrical properties of ZnO and Zn_(1-x)Mg_xO films by reactive RF magnetron sputtering[J].Journal of Crystal Growth,2005(1/2):170-179. |
| [22] | Park, H.-W.;Chung, K.-B.;Park, J.-S. .A role of oxygen vacancy on annealed ZnO film in the hydrogen atmosphere[J].Current applied physics: the official journal of the Korean Physical Society,2012(Suppl.2):S164-S167. |
| [23] | 马瑾,计峰,李淑英,马洪磊.退火处理对氧化锌透明导电膜的结构及电学特性的影响[J].半导体学报,1998(06):472. |
| [24] | 杨田林,张之圣,宋淑梅,辛艳青,姜丽莉,李延辉,韩圣浩.GZO/Ag/GZO多层薄膜制备、结构与光电特性的研究[J].功能材料,2009(11):1767-1769. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%