利用等离子体发射光谱监测系统(PEM)控制钒的等离子强度,在石英基底上磁控溅射制备了VO2薄膜。采用 XRD、XPS、SEM、紫外-可见-近红外分光光度计及傅立叶红外分光光度计研究薄膜的结构、光学及相变特性。结果表明,所制备的 VO2薄膜具有(011)取向,VO2薄膜的热滞回线宽度为25℃,可见光透过率和太阳光调节率分别可达T lum,l=34.1%、T lum,h=35.3%和ΔT sol=6.8%,相变前后,红外光区的反射率变化最大值可达44.4%。
Vanadium dioxide (VO2 )thin film was deposited on quartz glass by magnetron sputtering.The plas-ma emission monitoring (PEM)was used to control the plasma emission intensity of vanadium during the ex-periment.Investigations on the structure,optical properties and phase transition performance of the films using XRD,XPS,SEM,UV-Vis-NIR spectrophotometer and Fourier infrared spectrophotometer.The results show that the VO2 films have the (011)orientation,with the width of the hysteresis loop was 25℃.A sample with balanced luminous transmittance (Tlum)and switching efficiency (ΔTsol)of the films are about 34.1% (20℃) and 35.3 %(90℃),and 6.8%(ΔTsol),respectively.At the phase transition process,the maximum variation of reflectance in infrared regions up to 44.4%.
参考文献
| [1] | Pragna Kiri;Michael E.A. Warwick;Ian Ridley;Russell Binions .Fluorine doped vanadium dioxide thin films for smart windows[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2011(4):1363-1366. |
| [2] | Hongchen Wang;Xinjian Yi;Sihai Chen .Low temperature fabrication of vanadium oxide films for uncooled bolometric detectors[J].Infrared physics and technology,2006(3):273-277. |
| [3] | Nadel S J;Greene P .High rate sputtering technology for throughput and quality[J].International Glass Review,2001,45(03):45. |
| [4] | Chandrasekaran Venkatasubramanian;Orlando M. Cabarcos;William R. Drawl;David L. Allara;S. Ashok;Mark W. Horn;S. S. N. Bharadwaja .Process-structure-property correlations in pulsed dc reactive magnetron sputtered vanadium oxide thin films[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2011(6):061504-1-061504-7. |
| [5] | Fu GH;Polity A;Volbers N;Meyer BK .Annealing effects on VO2 thin films deposited by reactive sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(4):2519-2522. |
| [6] | Mei Pan;Hongmei Zhong;Shaowei Wang;Jie Liu;Zhif'eng Li;Xiaoshuang Chen;Wei Lu .Properties of VO_2 thin film prepared with precursor VO(acac)_2[J].Journal of Crystal Growth,2004(1/2):121-126. |
| [7] | Zhou, S.;Li, Y.;Zhu, H.;Sun, R.;Zhang, Y.;Huang, Y.;Li, L.;Shen, Y.;Zhen, Q.;Tong, G.;Fang, B. .Microstructures and thermochromic characteristics of low-cost vanadium-tungsten co-sputtered thin films[J].Surface & Coatings Technology,2012(11/12):2922-2926. |
| [8] | Du, J.;Gao, Y.;Luo, H.;Zhang, Z.;Kang, L.;Chen, Z. .Formation and metal-to-insulator transition properties of VO 2ZrV2O7 composite films by polymer-assisted deposition[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2011(7):1604-1609. |
| [9] | Zhang, Z.;Gao, Y.;Chen, Z.;Du, J.;Cao, C.;Kang, L.;Luo, H. .Thermochromic VO_2 thin films: Solution-based processing, improved optical properties, and lowered phase transformation temperature[J].Langmuir: The ACS Journal of Surfaces and Colloids,2010(13):10738-10744. |
| [10] | ZHU YaBin,HE Fan,NA Jie.Au doping effects on electrical and optical properties of vanadium dioxides[J].中国科学:物理学 力学 天文学（英文版）,2012(03):409-412. |
| [11] | 杨邦朝;王文生.薄膜物理与技术[M].成都:电子科技大学出版社,1994 |
| [12] | Christopher S. Blackman;C. Piccirillo;R. Binions;Ivan P. Parkin .Atmospheric pressure chemical vapour deposition of thermochromic tungsten doped vanadium dioxide thin films for use in architectural glazing[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2009(16):4565-4570. |
| [13] | Kakiuchida H;Jin P;Tazawa M .Control of thermochromic spectrum in vanadium dioxide by amorphous silicon suboxide layer[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2008(10):1279-1284. |
| [14] | 黄维刚,王燕.磁控溅射法在玻璃基片制备VO2薄膜的结构与性能[J].功能材料,2010(05):797-799. |
| [15] | J. Y. Suh;R. Lopez;L. C. Feldman;R. F. Haglund .Semiconductor to metal phase transition in the nucleation and growth of VO_(2) nanoparticles and thin films[J].Journal of Applied Physics,2004(2):1209-1213. |
| [16] | Guinneton F.;Valmalette JC.;Cros F.;Gavarri JR.;Sauques L. .Comparative study between nanocrystalline powder and thin film of vanadium dioxide VO2: electrical and infrared properties[J].The journal of physics and chemistry of solids,2001(7):1229-1238. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%