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采用磁控溅射的方法制备了带有 Ni 保护层和Zr-Co-Re(Re代表稀土元素)主体层的堆栈层薄膜吸气剂。通过X射线光电子能谱仪(XPS)分析了薄膜吸气剂内部 O 元素的含量分布,研究了薄膜吸气剂中Ni层的防氧化作用和机理。研究表明:(1)Ni/Zr-Co-Re堆栈层薄膜吸气剂在160℃保温3h 的条件下可以有效激活,并具有高于 Zr-Co-Ni 单层薄膜吸气剂的吸气性能;(2)Ni保护层降低了吸气剂的被氧化程度,促进了表面吸附的 H2分子的解离和扩散。

Non-evaporable getter (NEG)stack layer thin films including protective layer of Ni and subj ect layer of Zr-Co-Re (Re indicating rare earth element)were prepared by RF magnetron sputtering.XPS was used to measure the content distribution of O element in the thin film getters and the anti-oxidation mechanism was in-vestigated.The following results were concluded:(1)the stack Ni/Zr-Co-Re getter film activated at 160℃ for 3h shows higher gas absorption property than Zr-Co-Re single layer film;(2)the protective layer of Ni could not only protect the getter film from being oxidated but also improve the dissociation and diffusion of H2 molecule.

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