通过激光加热对 Ni81 Fe19(15 nm )/Ni45 Mn55(x nm)磁性双层膜进行快速退火处理,系统研究了激光辐照参数对交换偏置场(H ex )大小的影响。结果表明,激光的能量密度强烈影响双层膜交换偏置效应,并存在一个能量密度的阈值(约为150 mJ/cm2),此时磁性双层膜能够产生较明显的交换偏置现象。磁性双层膜的H ex 随着能量密度的进一步增加逐渐变大,但随后减小直至完全消失。当 NiMn 层厚度为25 nm时,经激光加热退火处理后双层膜的H ex 最大值约为26.2 kA/m,略大于常规退火后的 H ex 值(22.3 kA/m)。
This paper deals with the exchange bias in Ni81Fe19(15 nm)/Ni45Mn55(x nm)bilayers annealed by la-ser.The influences of the laser parameters on the exchange bias (H ex )were systematic investigated.The re-sults show that the H ex was strongly affected by the energy density of laser,and that there exists a threshold of energy density (about 150 mJ/cm2)where the exchange bias appears.With the increase of energy density,the exchange coupling becomes stronger and reaches a maximum;then it disappears gradually.In the case of the thickness of NiMn was 25 nm,the Hex was 26.2 kA/m after laser thermal annealing,which was slightly higher than that of conventional thermal annealing (22.3 kA/m).
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