通过溶胶-凝胶法制备了折射率连续可调的Si O 2薄膜，并将其应用于制备双层宽频增透膜。以正硅酸乙酯为前驱体，分别以盐酸和氨水为催化剂制备酸催化SiO2溶胶和碱催化 SiO2溶胶；将酸催化和碱催化的Si O 2溶胶按不同比例进行混合制得酸碱混合SiO2溶胶，最后通过浸渍-提拉法在 K9玻璃上制备SiO2薄膜。椭偏仪测试结果表明 SiO2薄膜的折射率在1.18~1.44之间连续可调，折射率随着酸催化SiO2溶胶比例的增加而增加。分别以折射率为1.41和1.18的SiO2薄膜为底层和上层，成功制备出在527和1053 nm处同时高增透的双层宽频增透膜。最后，以六甲基二硅氮烷为修饰剂，通过增透膜表面的有机修饰，提高了宽频增透膜的疏水性和耐环境性。
Abrstract:Silica thin films with controllable refractive index were prepared by sol-gel process,and used for preparation of broadband antireflective (AR)coating.Acid-catalyzed and base-catalyzed silica sols were pre-pared by using TEOS as precursor and HCl and ammonia as catalysts,respectively.The mixed silica sols with different content of acid-catalyzed silica were prepared by mixing acid-catalyzed and base-catalyzed silica sols to-gether.The resultant silica thin films on K9 substrates were prepared by the dip-coating process.It was found that the silica thin films possessed controllable refractive index from 1.18 to 1.44.A broadband AR coating ef-fective simultaneously at 527 and 1 053 nm was prepared by using silica thin films with refractive index of 1.41 and 1 .1 8 as bottom and upper layers,respectively.Finally,the hydrophobicity and environment-resistance of broadband AR coating were improved after the surface modification of AR coating with hexamethyldisiloxane (HMDS)as modifier.
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