采用卷绕型磁控溅射设备在涤纶(PET)针刺毡表面沉积了纳米结构 Cu 薄膜,利用 X 射线衍射仪(XRD)对薄膜的组分和结晶状态进行了分析,用原子力显微镜(AFM)分析了不同溅射工艺参数对纳米Cu薄膜微观结构和颗粒直径的影响,并较为系统地分析了溅射功率、工作气压和沉积时间对镀铜PET针刺毡导电性能的影响。结果表明,增大溅射功率,镀铜PET针刺毡导电性和 Cu 膜均匀性变好,但应控制在6 kW以下；随工作气压的增大,薄膜方块电阻先减小后增大,薄膜厚度更加均匀；随着沉积时间的延长,Cu粒子的直径增大,Cu膜的导电性和均匀性明显变好。
Nano-copper film was deposited on polyester needle-punched filter felt by winding type magnetron sputtering equipment.The components and crystalline state of nano-copper film were analyzed by using X-ray diffractometer (XRD).Atomic force microscope (AFM)was also used to characterize the microstructures of Cu thin films deposited on the surface of PET needled felt.The influence of the sputtering power,working pressure and deposition time on conductivity of copper coated PET needled felt was investigated systematically.Experi-mental results show that the conductivity and uniformity of copper film become better while the sputtering pow-er is increased.But it should be controlled under 6 kW.With the increase of working pressure,the square resist-ance of Cu thin film increases with the decrease in the first,and thin film thickness become more uniform.As the extension of deposition time,the diameters of the copper particles increase,while the conductivity and uni-formity of copper film significantly better.
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