采用射频磁控溅射工艺在 Si 基底上制备TiSiCN 纳米复合膜,固定靶材中的 Ti 含量,通过改变Si 和 C 的含量比沉积得到一系列薄膜,采用 X 射线衍射仪(XRD)、高分辨透射电子显微镜(HRTEM)、X射线光电子能谱(XPS)和纳米压痕仪研究了不同 Si/C含量比对 TiSiCN 纳米复合膜的微观结构和力学性能的影响.结果表明,Si/C 含量比对 TiSiCN 纳米复合膜的微观结构和硬度具有显著影响,当 Si/C 含量比为Si2 C2时制得薄膜的微观结构为晶化的界面相(SiNx ＋C)与其包裹的 TiN 纳米晶粒共格外延生长,薄膜硬度达到最高值46 GPa.
Fixing the content of Ti,a series of TiSiCN nanocomposite films with different Si/C ratio were deposi-ted on silicon substrate by RF magnetron sputtering.Using X-ray diffraction (XRD),high resolution transmis-sion electron microscopy (HRTEM),X-ray photoelectronic spectroscopy (XPS)and nano-indentation tech-niques,the influences of Si/C ratio on microstructure and mechanical property of TiSiCN nanocomposite films were investigated.The results show that,the n (Si)/n (C)ratio has a significant impact on the microstructure and hardness of the films.When the ratio of n (Si)/n (C)content was 2∶2,the TiSiCN film was characterized as the nanocomposite structure with TiN nanocrystallites surrounded by the crystallized (SiNx +C)interfacial phase.Due to the coherent growth between TiN nanocrystallites and (SiNx +C)interfacial phase,the hardness of TiSiCN film reaches to 46 GPa.
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