采用TiSi复合靶和 Al 靶,用射频磁控溅射工艺沉积不同 TiSiN 层厚度的 AlN/TiSiN 纳米多层膜.采用 X 射线衍射仪(XRD )、扫描电子显微镜(SEM)、高分辨透射电子显微镜(HRTEM)和纳米压痕仪研究了不同 TiSiN 层厚度对 AlN/TiSiN 纳米多层膜的微观组织和力学性能的影响.结果表明,随着TiSiN层厚度的增加,AlN 相的结晶程度先增加后降低,涂层的硬度先提高后降低,当 TiSiN 层厚度为0．5 nm时具有最高的硬度和弹性模量.HRTEM观测可知,在TiSiN层厚度为0．5 nm 时,TiSiN 层在 AlN层的模板作用下呈密排六方结构,并与 AlN 层呈共格外延生长,薄膜的强化主要与共格外延生长结构有关.
The paper chooses TiSi and Al targets,a series of AlN/TiSiN nanomultilayered films with different TiSiN layer thickness were deposited on the Si substrate by means of radio frequency magnetron sputtering method.By X-ray diffractometry (XRD),scanning electron microscopy (SEM),high resolution transmission e-lectron microscopy (HRTEM)and nano-indentation techniques research the effect of the microstructure and mechanical properties of AlN/TiSiN nanomultilayered film with the different TiSiN layer thickness.The results showed that with the increase of TiSiN layer thickness,the degree of AlN phase crystallization firstly increased and then decreased,and the Hardness of the coating increased firstly improve and then worsen.The hardness and elastic modulus(280 and 28.97 GPa)is the highest when the TiSiN layer thickness is 0.5 nm.The HRTEM observation show that,when the TiSiN layer thickness is 0.5 nm,TiSiN layer grow epitaxially with AlN layers, and exhibit close-packed hexagonal structure under the template effect of AlN layers,the strengthening of the film can be attributed to the coherent growth structure.
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