利用磁控溅射法,研究了不同基底温度和工作气压对 CdTe 薄膜微纳米结构的影响. XRD 和SEM表征结果表明,基底温度直接决定着 CdTe 粒子的生长和表面扩散能力,工作气压会直接影响入射在衬底表面的粒子能量,溅射功率决定提供 CdTe 粒子的量.通过生长条件的进一步探索和优化,最终在溅射功率为84 W、工作气压为0．4 Pa和石英基底温度为200~450℃时成功获得直径约150 nm,形貌均一的一维CdTe纳米棒阵列.
The different microstructures of CdTe thin films are prepared by magnetron sputtering method through changing the substrate temperature,working pressure and sputtering power.The XRD and SEM re-sults show that the abilities of growth and surface diffusion of CdTe particles are directly determined by the substrate temperature.Meanwhile,the working pressure can affect the energy of incident CdTe particles and the quantities of the CdTe particles are determined by the sputtering power.Finally,the uniform one-dimen-sional CdTe nanorod arrays with diameter about 150 nm are achieved at sputtering power of 84 W,working pressure of 0.4 Pa and the temperature of quartz substrate within 200-450 ℃.
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