采用直流反应磁控溅射法,在石英基片上沉积WO 3薄膜,考察了溅射参数对WO 3薄膜结构及其性能的影响,并通过后续热处理得到不同物相结构的薄膜,分析探讨薄膜光致变色与光催化性能间的内在关联.利用XRD、SEM、UV-Vis和UV-Vis-Nir分别对WO3薄膜的晶型、表面形貌、光学特征及光催化等性能进行分析与表征,实验结果表明,反应溅射氧氩比不同时,WO 3薄膜的光致变色效果不同,变色效果越好的薄膜光催化活性越高;热处理导致WO 3薄膜光致变色特性的消失和光催化活性的降低,未处理得到的非晶态WO 3具有最好的光催化活性.
WO3 thin films were deposited by DC reactive magnetron sputtering on the quartz substrate,and the structure and properties of WO3 thin films were studied at different DC-sputtering parameters.Different phase structures of the WO3 thin films were obtained after heat treatment at different temperature.The inherent links and the functioning mechanism between photocatalysis and photochromism were investigated.The structure, morphology,optical property and photocatalytic activity of WO3 thin films were characterized through XRD, SEM,UV-Vis and UV-Vis-Nir,respectively.The WO3 thin films present varied photochromic efficiency at dif-ferent oxygen argon ratio,and the highest photocatalytic activity of WO3 thin films presented the best photo-chromism.Both photochromism and the photocatalytic property degraded after heat-treatment,and the cata-lysts activity of WO3 thin film unheated was better than that of the heated one.
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