利用磁控溅射方法在Si(111)衬底上制备了厚度为1μm 的非晶 SiNx 薄膜，采用纳米压痕方法研究了薄膜的变形和断裂行为.傅立叶变换红外光谱显示实验获得了较为纯净的 SiNx 薄膜.SiNx 薄膜在纳米压痕下呈现出放射状的脆性断裂特征，随着压入深度的增大，放射状裂纹的长度逐渐增加.最大压入深度达到1500 nm时，薄膜和衬底间出现了扇形的界面断裂，并且这一界面断裂是在卸载过程中发生的.到最大压入深度达到2500 nm时，原位原子力显微镜照片可以清晰的观察到界面断裂及放射状裂纹.界面断裂韧性计算结果表明， SiNx 薄膜和Si(111)衬底间易形成脆性较大的共价结构界面，这是其界面断裂韧性较小的原因.
An amorphous SiNx coating was deposited on a Si(111)substrate by using reactive magnetron sputte-ring a Si target.The deformation mechanisms and fracture behavior of the coating is characterized by nanoinden-tation experiments.FT-IR spectrum shows that the coating does not contain impurities like the Si—O bond. The SiNx coating shows median/radial fracture properties like the Si(111)substrate during nanoindentation ex-periments,and the cracks develop with the increase of displacement.As the peak displacement increases to 1 500 nm,a fan-like interfacial fracture between two median/radial fractures is observed during the unload seg-ment.When the peak displacement increases to 2 500 nm,an obvious blister with a diameter of 27.3μm were observed on the AFM image.The low interfacial fracture toughness value may be due to the appearance of cova-lence microstructures between the SiNx coating and the Si(111)substrate.
参考文献
| [1] | Xiaoping Hu;Huijian Zhang;Jiawei Dai.Study on the superhardness mechanism of Ti-Si-N nanocomposite films; Influence of the thickness of the Si_3N_4 interfacial phase[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,20051(1):114-117. |
| [2] | Hans Soderberg;Magnus Oden;Axel Flink.Growth and characterization of TiN/SiN(001) superlattice films[J].Journal of Materials Research,200711(11):3255-3264. |
| [3] | T. An;M. Wen;L.L. Wang.Structures, mechanical properties and thermal stability of TiN/SiN_x multilayer coatings deposited by magnetron sputtering[J].Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics,20091/2(1/2):515-520. |
| [4] | J. Yota;A. A. Saleh;J. Hander.A comparative study on inductively-coupled plasma high-density plasma, plasma-enhanced, and low pressure chemical vapor deposition silicon nitride films[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,20002(2):372-376. |
| [5] | 安涛;文懋;田宏伟;王丽丽;宋立军;郑伟涛.TiN 薄膜在纳米压痕和纳米划痕下的断裂行为*[J].物理学报,2013(13):136201-1-136201-8. |
| [6] | T.An;L.L Wang;H.W.Tian;M.Wen;W.T.Zheng.Deformation and fracture of TiN coating on a Si(111) substrate during nanoindentation[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,201117(17):7475-7480. |
| [7] | An, T;Wen, M;Hu, CQ;Tian, HW;Zheng, WT.Interfacial fracture for TiN/SiNx nano-multilayer coatings on Si(111) characterized by nanoindentation experiments[J].Materials Science and Engineering. A, Structural Materials: Properties, Microstructure and Processing,20081/2(1/2):324-328. |
| [8] | Chen J;Bull SJ.Indentation fracture and toughness assessment for thin optical coatings on glass[J].Journal of Physics, D. Applied Physics: A Europhysics Journal,200718(18):5401-5417. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%