以硅为基底，采用反应离子刻蚀技术和自组装技术制备疏水/超疏水表面，测量各表面的静态接触角和滚动角，借助高速摄像系统分析液滴滴落到不同硅表面的运动特性。结果表明，微柱高度不同，接触角随微柱间距的变化规律不同；滚动角随微柱高度的增加而增大，随微柱间距的增加而减小。对于液滴在其上能够发生滚动的硅表面，当水平放置时，液滴滴落后，铺展系数和回弹系数均随着跳动次数的增加逐渐减小，且滚动角越大，其减小速度越快；当硅表面倾斜放置时，若倾斜角小于滚动角，液滴滴落后的跳动距离越来越小，且滚动角越大，跳动距离减小的速度越快；若倾斜角大于滚动角，则液滴跳动距离越来越大，但滚动角越大，跳动距离增大的速度越小。
Based on the technology of reactive ion etching and self-assembled monolayers,the Si specimens with different hydrophobicity were attained.The static contact angle and roll angle of specimens are measured.After dripping,the dynamic characteristics of drop moving on the Si surface were researched by the high speed camera system.The results show that,when the heights of micro pillar arrays are different,the relationships between water contact angle and spacing of micro pillar arrays are different.The roll angle increases with the increase of pillars’height while decreases with the increase of pillars’spacing.In addition,after dripping down to the hori-zontal Si surface possessed roll angle,the spread coefficient and rebound coefficient of drop will decline gradual-ly,and the larger the roll angle is,the quicker the decline rate.If the Si surface is inclined,and the incline angle is smaller than the roll angle,the j ump distance will be smaller.The larger the roll angle is,the quicker the dis-tance decreases.On the contrary,if the incline angle is bigger than the roll angle,the j ump distance will in-crease.However,the larger the roll angle is,the slower the distance increases.
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