利用电化学噪声研究了纯镁在不同厚度薄液膜下的腐蚀行为.结果表明:与本体溶液相比,薄液膜对纯镁腐蚀的阳极过程有使点蚀的孕育速度减缓作用的同时还有使点蚀生长的概率增加的作用;薄液膜下纯镁表面产生的亚稳态点蚀牛长成稳态点蚀的概率比本体溶液下的大.点蚀孕育速度比点蚀生长概率对阳极过程的影响更大;这导致r薄液膜下纯镁腐蚀的阳极过程减缓.
参考文献
[1] | 陈崇木,崔宇,张涛,等.利用电化学方法研究纯镁在薄液膜下的腐蚀行为Ⅰ-O2对纯镁在薄液膜下腐蚀行为的影响[J].腐蚀科学与防护技术,2009,21(2): |
[2] | Na K,Pyun S.Electrochemical noise analysis of corrosion of pure aluminium in alkaline solution in the presence of SO42-ion,NO3-ion and Na2S additives[J].Electroehim.Aeta,2007,52:4363. |
[3] | Sanehez-Amaya J,Cottis R,Botana F.Shot noise and statistical parameters for the estimation of corrosion mechanisms[J].Corros.Sei.,2005,47:3280. |
[4] | Valor A,Caleyo F,Alfonso L,et al.Stochastic modeling of pitting corrosion:A new model for initiation and growth of multiple corrosion pits[J].Corros.Sei,2007,49:559. |
[5] | Gumbel E J.Statistics of Extremes[M].New York:Columbia University Press,1957.375. |
[6] | Pride S,Seully J,Hudson J.Metastable pitting of aluminum and critiria for the transition to stable pit growth[J].J.Electrochem.Soc.,1994.141:3028. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%