欢迎登录材料期刊网

材料期刊网

高级检索

许多年来,氮化钛镀膜的使用相当普遍.在周期表中与钛属于同一周期的另一过渡元素锆,亦是一引人注目的材料.已有许多关于氮化锆的研究,然而,对碳氮化锆的了解仍然有限.本研究使用非平衡磁控溅镀系统制备了ZrCN镀膜,探讨了C2H2/N2 反应气体流量比例、以及添加Ti、W等对ZrCN硬度和磨耗性能的影响.结果显示,在总反应气体流量固定不变状态下,ZrCN硬度及磨润性能随反应气体流量比例降低而增加;添加Ti和W会显著增加ZrCN的硬度和磨耗性能,添加Ti的效果比添加W的佳.不论有无添加物,ZrCN的磨耗性能皆明显比TiN的佳.

参考文献

[1] Hultman L .Thermal stability of nitride thin films[J].VACUUM,2000,57:1-30.
[2] Wu D;Zhang Z;Fu W;Fan X;Guo H .Structure, electrical and chemical properties of zirconium nitride films deposited by dc reactive magnetron sputtering[J].Applied physics, A. Materials science & processing,1997(6):593-595.
[3] Kelesoglu E;Mitterer C;Kazmanli M K et al.Microstructure and properties of nitride and boride hard coatings deposited under intense mild-energy ion bombardment[J].Surface and Coatings Technology,1999,116/119:133-140.
[4] Sue J A;Chang T P .Friction and wear behavior of titanium nitride,zirconium nitride and chromium nitride coatings at elevated temperatures[J].Surface and Coatings Technology,1995,76/77:61-69.
[5] Sakamoto I;Maruno S;Jin P .Preparation and microstructure of reactively sputtered Ti1-xZrxN films[J].THIN SOLID FILMS,1993,228:169-172.
[6] Wang CC.;Chen W.;Patton VD.;Akbar SA. .ELECTRICAL PROPERTIES OF HIGH-TEMPERATURE OXIDES, BORIDES, CARBIDES, AND NITRIDES [Review][J].Journal of Materials Science,1995(7):1627-1641.
[7] Raymond Constantin;Baham Miremad .Performance of hard coatings, made by balanced and unbalanced magnetron sputtering, for decorative applications[J].Surface & Coatings Technology,1999(0):728-733.
[8] K. -T. Rie;J. Wohle .Plasma-CVD of TiCN and ZrCN films on light metals[J].Surface & Coatings Technology,1999(1/3):226-229.
[9] J. Wohle;C. Pfohl;K. -T. Rie;A. Gebauer-Teichmann;S. K. Kim .Deposition of TiCN and ZrCN layers on light metals by PACVD method using radio frequency and pulsed-DC plasma[J].Surface & Coatings Technology,2000(1/3):127-130.
[10] Alberts L.;Boscarino D.;Patelli A.;Rigato V.;Ahn H.;Rie KT. .Ion beam analysis of low-temperature MO-PACVD coatings[J].Surface & Coatings Technology,2003(0):388-392.
[11] í cha M (s;Hubicka S;Soukup L et al.Low-pressure RF multi-plasma-jet system for deposition of alloy and composite thin films[J].Surface and Coatings Technology,2001,148:199-205.
[12] Shiota K.;Minami K.;Hanna J.;Inoue D. .Structural and electrical properties of poly-SiGe thin films prepared by reactive thermal CVD[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,1998(Pt.B):1074-1078.
[13] Jelenkovic EV.;Tong KY. .Effect of SiGe thickness on crystallisation and electrical properties of sputtered silicon film in Si/SiGe/insulator structure[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,1998(1/4):143-149.
[14] Sasaki K;Nakata K;Hata T .Epitaxial growth of SiGe thin films by ion-beam sputtering[J].Applied Surface Science,1997,114:43-47.
[15] Hollstein F.;Louda P.;Pacal F.;Meinhardt J.;Kitta D. .Investigation of low-reflective ZrCN-PVD-arc coatings for application on medical tools for minimally invasive surgery[J].Surface & Coatings Technology,2001(0):1063-1068.
[16] Rie K-T;Gebauer A;W(O)hle J .Plasma assisted CVD for low temperature coatings to improve the wear and corrosion resistance[J].Surface and Coatings Technology,1996,498:86-87.
[17] Vaz F;Rebouta L;Ramos S et al.Physical,Structural and mechanical characterization of Ti1-xSixNy films[J].Surface and Coatings Technology,1998,108/109:236-240.
[18] Ohtani Y;Hofman S .High temperature oxidation behaviour of (Ti1-xCrx)N coatings[J].Thin Solid Films,1996,287:188-192.
[19] Su Y L;Yao S H;Wu C T .Comparisons of characterizations and tribological performance of TiN and CrN deposited by cathodic arc plasma deposition process[J].Wear,1996,199:132-141.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%