采用射频磁控反应溅射在单晶Si(100)上沉积了一系列不同Al含量的(Zr,Al)N薄膜,利用能谱仪(EDS)、X射线衍射仪(XRD)、扫描电镜(SEM)和微力学探针对薄膜的成分、结构、力学和抗氧化性能进行了表征.研究结果表明,当Al含量在0%～20.31%(原子分数)之间时,薄膜是B1型(NaCl)单相结构;当Al含量为31.82%时,同时出现B1和B4型(ZnS)双相结构.当Al含量超过36.82%时,以B4结构为主.随着铝含量的增加,薄膜晶面间距减小,晶格常数变小.薄膜的力学性能测试表明,适当的Al含量可以提高薄膜的硬度.随着Al含量的增加,薄膜的抗氧化性能得到改善,对于B1型(Zr,Al)N薄膜,其结构稳定性也得到增强.
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