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介绍了几种立方氮化硼(C-BN)薄膜的制备工艺,并对薄膜中立方氮化硼相形成的影响因素进行了讨论.

参考文献

[1] Wada T;Yamashita N .Formation of C-BN films by ion beam assisted deposition[J].J Vac Scl Techonl,1992,A1o(03):515-518.
[2] Shlnichi;Kikkawa .Rf-sputter deposition of boron nitride thin films[J].Nuclear Instruments and Methods in Physics Research,1991,B59/60:341-344.
[3] Chopra KL;VandnaA;VankarVD .Synthesis of cuhic boron nitride films by activated reactive evaporation of H3BO3[J].Thin Solid Films,1985,126:307-310.
[4] Bouchier D;Bosseboeuf .Nuclear reaction analyscs of boron nitride films deposited by ion beam based techniques[J].Nuclear Instruments and Methopds in Physics Research,1992,B64:765.
[5] 王钧石.Cr12MoV钢PSII氮离子注入层的组织与性能[J].材料开发与应用,2008(04):17-19.
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