采用自制的1 kW石英钟罩式微波等离子体化学气相沉积装置,以氢气和甲烷作为气源在镜面抛光的(100)面单晶硅片上沉积了金刚石薄膜.实验共制得两个样品,其中一个样品在制备的过程中加装了难熔的金属钽环,利用等离子体易吸附于金属钽环表面的特性,缩小了硅片中间与边缘等离子体密度差异,另外一个样品没有加装难熔的金属钽环.利用激光拉曼光谱仪和扫描电子显微镜(SEM)对制备的样品进行了表征,发现没有加装金属钽环的样品中间位置沉积的金刚石膜质量明显高于边缘位置沉积的金刚石膜,中间位置、离中间5mm位置、边缘位置沉积膜层的厚度差别很大;加装了金属钽环的样品中间位置与边缘位置沉积的金刚石膜质量差不多,中间位置、离中间5 mm位置、边缘位置沉积膜层的厚度差别不大,上述结果证明金属钽环的加入是一种提高MPCVD法制备金刚石膜均匀性的方法.
参考文献
| [1] | 满卫东,汪建华,王传新,马志斌.金刚石薄膜的性质、制备及应用[J].新型炭材料,2002(01):62-70. |
| [2] | May PW. .Diamond thin films: a 21st-century material[J].Philosophical transactions of the Royal Society. Mathematical, physical, and engineering sciences,2000(1766):473-495. |
| [3] | Michael Schwander;Knut Partes .A review of diamond synthesis by CVD processes[J].Diamond and Related Materials,2011(9):1287-1301. |
| [4] | 吕继磊,满卫东,陈朋,朱金凤,吴飞飞.硬质合金CVD金刚石涂层最新进展[J].硬质合金,2011(05):321-331. |
| [5] | Alix Gicquel;Khaled Hassouni;Francois Sliva et al.CVD diamond films:from growth to applications[J].Current Applied Physics,2001,1(06):479-496. |
| [6] | Irifune T;Hemley R J .Synthetic diamond opens windows into the deep earth[J].Eos Transactions American Geophysical Union,2012,93(07):65-76. |
| [7] | 满卫东,汪建华,马志斌,王传新.微波等离子体化学气相沉积--一种制备金刚石膜的理想方法[J].真空与低温,2003(01):50-56. |
| [8] | Herlinger J .sp3's experience using hot filament CVD reactors to grow diamond for an expanding set of applications[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1/2):65-69. |
| [9] | Diane S.Knight;William B.White .Characterization of diamond films by Raman spectroscopy[J].Journal of Materials Research,1989,4(02):385-393. |
| [10] | Gonon P.;Deneuville A.;Abello L.;Gheeraert E. .RAMAN STUDY OF DIAMOND FILMS DEPOSITED BY MPCVD - EFFECT OF THE SUBSTRATE POSITION[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1995(1/2):13-22. |
| [11] | Yutaka Ando;Yoshihiro Yokota;Takeshi Tachibana;Akihiko Watanabe;Yoshiki Nishibayashi;Koji Kobashi;Takashi Hirao;Kenjiro Oura .Large area deposition of <100>-textured diamond films by a 60-kW microwave plasma CVD reactor[J].Diamond and Related Materials,2002(3-6):596-600. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%