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  4. 二氧化铈浆料抛光机理的研究进展

稀土, 2012, 33(1): 68-73. doi: 10.3969/j.issn.1004-0277.2012.01.015

二氧化铈浆料抛光机理的研究进展

刘军 1, , 宋晓岚 2,

1.江西桑海经济技术开发区安全生产监督管理局,江西南昌330115

2.中南大学资源加工与生物工程学院,湖南长沙410083

基金项目:   科技部国际科技合作项目(2005 DFBA028)  

关键词： 二氧化铈 , 抛光机理 , 物理作用 , 化学作用 , 化学机械抛光

Research and Prospect of the CeO2 Slurry Polishing Mechanism

由于具有抛光速率快、选择性好、自动停止等特点,二氧化铈浆料被广泛用于材料的表面抛光处理,但抛光机理研究的相对滞后严重制约其物化改性和推广.针对这一现状,本文介绍了二氧化铈浆料抛光过程中的物理作用及化学作用,总结了化学机械抛光机理,并对今后研究方向提出了展望.

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