概括介绍了厚膜金导体浆料。通过改变金粉、粘结剂和有机载体等主要组份的类型和含量,可以制得多种金浆料。①粘结剂类型对厚膜金导体的性能有较大的影响。根据附着机理分类,厚膜金导体分为4种主要类型,即玻璃结合型、反应结合型、混合结合型和表面活化结合型。②金粉颗粒的均匀性、单分散性、表面形态及尺寸对浆料的印刷性能和烧结性能影响大。颗粒表面越光滑,对提高印刷性能越有利。光滑的表面吸附有机载体较少,可减少导体膜在烘干—烧结时的收缩率。③有机载体的含量和流变学性能影响金浆料的印刷性能及烘干—烧结时的收缩率。④金浆中添加起合金化作用的元素,可提高导体在铝丝键合体系及Pb-In焊接体系的热老化性能。⑤为适应新的厚膜工艺技术的需要,研制可光刻的厚膜金导体浆料和金的金属有机浆料[Au MOC]。
Thick-film gold conductor pastes are summarized in this paper.Many kinds of gold pastes are made by changing types and contents of main components such as gold powder,binder and organic vehicle.1.The types of binders deeply affect the characteristics of thick-film gold conductors.Depending on the adhesion mechanisms,thick-film gold conductors are classified into four main types:the fritted-bonded,the reactivity-bonded,the mixed-bonded and the surface activated-bonded systems.2.The homogeneity,monodisperesability,morphology and size of the gold powder particles greatly influence the paste printability and sintering properties.The smoother surface renders the pastes greater printability,and the lower vehicle absorption rate resulting from smooth surface can reduce shrinkage.3.The content and rheology of organic vehicle influence the paste printability and dried-fired shinkage.4.The addition of alloyed elements to gold pastes can improve the thermal-ageing performance in Al-wire bonding and in Pb-In soldering.5.Suiting the needs of new thick-film processes,photo etchable thick-film gold conductor pastes and gold metallo-organic composition[Au MOC]are devoloped.
参考文献
[1] | Thibault D L.Characterization of precious metal powders for thick film[A].Scottsdale Arizona,USA:International Precious Metals Institute,1992:257-264. |
[2] | Riemer Dietrich E.Optimized adhesion mechanism of thick-film multilayer gold[A].,1985:417-423. |
[3] | 俞守耕 .厚膜导体机理述评[J].电子元件与材料,1983,1:41-49. |
[4] | Becher P F;Murday J S.Factors affecting thick film adhesion[A].October 11~13 1976,Vancouver,Canada.USA:International Society For Hybrid Microelectronics,1976:235-237. |
[5] | 曲喜新.电子元件材料手册[M].北京:电子工业出版社,1989:449-458. |
[6] | Colcman M V;Gurnett G E .Gold thick film conductors[J].Gold Bulletin,1977,10(03):74-75. |
[7] | 吕乃康;樊百昌.厚膜混合集成电路[M].西安:西安交通大学出版社,1990:44-46. |
[8] | Anon .A new generation of thick-film gold conductor pastes[J].Gold Bulletin,1975,8(01):13-15. |
[9] | Coleman M V;Gurnett G E .The limitions of reactively-bonbed thick film gold conductor[J].Solid State Technology,1979,22(03):45-51. |
[10] | Johnson D R;Uribe F.The effct of multiple refiring on the adhesion of thick film conductors[A].Baltimore USA:International Society For Hybrid Microelectronics,1977:1-7. |
[11] | Panousis N T .Copper and silver contamination of thick film gold surfaces[J].THIN SOLID FILMS,1979,64(01):41-45. |
[12] | Horowitz S J;Felten J J;Gery D F et al.Recent developments in gold conductor bonding performace and failure mechanisms[J].Solid State Technology,1979(22):37-44. |
[13] | Hicks W T.Conductors materials processing and controls[A].New York: McGraw-Hill Book Company,1974:5-1-5-36. |
[14] | Degraeuwe J;Brauns E;Overstraen R V et al.Sintering mechanisms in base metal conductors[J].Electrocomponent Science and Technology,1980,7(07):113-118. |
[15] | 虎轩东.厚膜微电子技术[M].成都:电子元件与材料编辑部,1989:214-215. |
[16] | Getty R R;Taylor B E;Needes C R S .High perfomace thick film gold conductors[J].Solid State Technology,1983,26(10):163-168. |
[17] | Shiro Kadota;Koshiro Shibata.Gold conductor pastes for high density circuits[J].Electrocomponent Science and Technology,1981(09):31-41. |
[18] | Nordstrom T V;Yost F G .Sintering behavior of a reactivtely bonded thick film gold ink[J].Journal of Electronic Materials,1978,7(01):109-122. |
[19] | Yoshiyuki Zeniya.New etchable thick film gold conductors for thermal print head[A].Lake Tahoe Nenada.USA:International Precious Metals Institute,1986:409-417. |
[20] | Coleman M V.Evaluation of thick film conductors[A].Brigton England October 19~21,Great Britain England:Kiver Communications Limted,1976:1-15. |
[21] | Maciolek R B;Pisacich E D;Speershneider C J.Thermal aging characteristics of In-Pb solder bonds to gold[A].,1977:209-212. |
[22] | Ewell G J;Roth J A.Metallurgical criterid for selection of solders for microelectronics uses[A].Vancouver Canada.USA:International Society For Hybrid Microelectronics,1976:239-248. |
[23] | Philofsky E.Intermetallic formation in gold-aluminum systems[J].Solid-State Electronics,1970(13):1391-1399. |
[24] | Ditez R L.New gold alloy for aluminum bonding in MOS hermetic packages[A].USA,1977:367-373. |
[25] | Horowite S J;Gerry D J;Cote R E.Aolly element addition to gold thick film conductors:effects on Indium/Lead soldering and ultrasonic aluminum wire bonding[A].,1977:358-366. |
[26] | lsamu Nishino;Koichiro Mukoyama;Susumu Tomiyama.Gold in lC packaging[A].,1987:626-632. |
[27] | 李世鸿;郎彩;杜红云 等.适合铝丝键合后热老化要求的金导体浆料[J].电子元件与材料,1997,16(02):13-16. |
[28] | 郎彩;李世鸿;杜红云 等.光刻用有机金浆的研究[J].电子元件与材料,1997,16(05):27-30. |
[29] | 郎彩,李世鸿.光刻有机金浆的制备[J].贵金属,1996(03):38-39. |
[30] | 何中伟,周冬莲.厚膜直接描绘工艺[J].电子元件与材料,1999(05):3-6. |
[31] | 高卫宁.电子浆料新技术[M].成都:国营宏明无线电器材总厂专利室发行,1991:352-372. |
[32] | Teng K F;Vest Robert W.Liquid ink jet printing with MOD ink for hybrid microcircuits[J].IEEE Transactions on Components Packaging and Manufacturing Technology,1987(04):545-549. |
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