CVD在铱涂层和薄膜制备中的应用

贵金属, 2002, 23(1): 53-56. doi: 10.3969/j.issn.1004-0676.2002.01.012

CVD在铱涂层和薄膜制备中的应用

胡昌义 ^1, , 李靖华 ^2, , 高逸群 ^3, , 邓德国 ^4, , 尹志民 ^5,

1.贵研铂业股份有限公司,中国昆明,650221

2.贵研铂业股份有限公司,中国昆明,650221

3.贵研铂业股份有限公司,中国昆明,650221

4.贵研铂业股份有限公司,中国昆明,650221

5.中南工业大学,中国长沙,410083

基金项目: 云南省自然科学基金(2000E0085M)

关键词：化学气相沉积 , 铱 , 涂层 , 薄膜

Application of CVD Technique in Preparation of Iridium Coatings and Iridium Films

简要介绍化学气相沉积(CVD)技术的一般原理,评述CVD在贵金属铱涂层和薄膜制备方面的应用状况,主要包括:①制备石墨和难熔金属的铱保护涂层;②在石墨和陶瓷基体上沉积铱薄膜.

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