以乙酰丙酮铱和乙酰丙酮铂为前驱体,采用金属有机化合物化学气相沉积(MOCVD)技术在钼基体上沉积了PtIr薄膜.研究了前驱体加热温度对PtIr薄膜结构、成分和沉积速率的影响.结果表明,MOCVD的PtIr薄膜为合金膜,Pt-Ir合金薄膜成分、沉积速率随前躯体加热温度变化而变化,并存在极值点.
PtIr films were prepared by metal-organic chemical vapor deposition (MOCVD) on molybdenium substrates using acetylacetonate as the precursor. The effects of the heating temperature of the precursors on the microstructure, composition and the deposition rate of Pt-Ir films were studied. The results showed that it was possible to produce Pt-Ir alloy films by MOCVD. The composition and deposition rate varied with the temperature, and there was an extreme point.
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