采用镶嵌靶、通过直流磁控溅射法在不加热的情况下于硅基片上制备了Ti-49.57%Ni-5.6%Cu合金薄膜.XRD图谱表明,该薄膜为非晶态.对其进行的退火晶化后的形状记忆性能研究发现:薄膜分别经550℃×0.5 h、650℃×0.5 h晶化处理后无残余塑变存在下的最大恢复应力、最大恢复应变分别为180 MPa、2.7%;90 MPa、1.4%.
参考文献
[1] | 李亚东,崔大奎,骆苏华.RF磁控溅射工艺对TiNi(1-x)Cux合金薄膜组织形貌的影响[J].材料科学与工艺,2002(03):295-298. |
[2] | DU Hejun;FU Yongqing .Deposition and characterization of Ti1-x (Ni,Cu)x shape memory alloy thin films[J].Surface and Coatings Technology,2004,176:186. |
[3] | MIYAZAKI S;HASHINAGA T;ISHIDA A .Martensitic in sputter-deposited Ti-Ni-Cu shape memory alloy thin films[J].Thin Solid Films,1996,281-282:367. |
[4] | MATSUNAGA T .Internal structures and shape memory properties of sputter-deposited tin films of a Ti-Ni-Cu alloy[J].Acta Materialia,2001,49:1925-1926. |
[5] | KAZUHIRO O;REN Xiaobing .Recent developments in the research of shape memory alloys[J].INTERMETALLICS,1999,511-528:514. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%