在有机熔盐电镀铝体系的构成、物理和电化学性质的基础上,对卤化烷基吡啶类、卤化烷基咪唑啉类、氯化烷芳基铵盐类电镀铝及铝合金的研究现状进行了阐述,并对这3种有机熔盐电镀铝体系的优缺点进行了归纳总结.最后,指出了有机熔盐电镀铝体系的应用前景和发展方向.
参考文献
[1] | 李小凡,王玲玲,王新华,胡望宇.电镀铝的研究进展[J].材料导报,2001(12):14-16. |
[2] | LI Qingfeng;QIU Zhuxian.Applied electrochemistry of aluminum production and applications[M].沈阳:东北大学出版社,2003:117-154. |
[3] | 夏扬,王吉会,王茂范.铝合金电镀的研究进展[J].材料导报,2005(12):60-63. |
[4] | 王吉会,夏扬,王茂范.无机熔盐镀铝层的制备与性能研究[J].兵器材料科学与工程,2005(06):1-5. |
[5] | 冯秋元,丁志敏.熔融盐电镀铝的研究进展[J].电镀与环保,2003(05):1-4. |
[6] | HURLEV F H;WIER T P .The electrodeposition of aluminum from nonaqueous solutions at room temperature[J].Journal of the Electrochemical Society,1951,98(05):207-212. |
[7] | 余天桃,冯尚彩,尹静.室温离子液体的研究进展[J].化学分析计量,2003(03):51-54. |
[8] | 顾彦龙,石峰,邓友全.室温离子液体:一类新型的软介质和功能材料[J].科学通报,2004(06):515-521. |
[9] | 陈建华 .低温熔盐体系铝电沉积[J].表面技术,1994,23(04):159-163. |
[10] | ROBINSON J;BUGLE R C;CHUM H L et al.IH and 13C nuclear magnetic resonance spectroscopy studies of aluminum halide-alkylpyridinium halide molten salts and their benzene solutions[J].Journal of the American Chemical Society,1979,101(14):3776-3779. |
[11] | MANANFOV;MARASSI R.Molten salt chemistry:an introduction & selected applications[M].Dordrecht:Kluwer academic press,1987:336. |
[12] | GALE R J;OSTERYOUNG R A .Potentiometric investigation of dialuminum heptachloride formation in aluminum chloride-l-butylpyridinium chloride mixtures[J].Inorganic Chemistry,1979,18(06):1603-1605. |
[13] | QIN Q X;SKYLLAS K M .Electrodeposition and dissolution of aluminium in ambient temperature molten salt system aluminium chloride:n-butylpyridinium chloride[J].Journal of Electroanalytical Chemistry,1984,168:193-206. |
[14] | CARLIN R T;CRAWFORD W;BERSH M .Nucleation and morphology studies of aluminum deposited from an ambient temperature chloroaluminate molten salt[J].Journal of the Electrochemical Society,1992,139(10):2720-2727. |
[15] | SAFRANEK W H;SCHICKNER W C;FAUST C L .Electroforming aluminum waveguides using organo-aluminum plating baths[J].Journal of The Electrochemical Society,1952,99(02):53-59. |
[16] | ZHAO Y G;VANDERNOOT T J .Review:electrodeposition of aluminium from nonaqueous organic electrolytic system and room temperature molten salts[J].Electrochimica Acta,1997,42(01):3-13. |
[17] | ROBINSON J;OSTERYOUNG R A .An electrochemical and spectroscopic study of some aromatic hydrocarbons in the room temperature molten salt system aluminum chloride-n-butylpyridinium chloride[J].Journal of the American Chemical Society,1979,101(02):323-327. |
[18] | 高桥节子;秋元菊子;佐伯功 .1-ブチルピリジニウムクド-AlCl3系常温溶融塩浴からの電気Alめっき[J].表面技术,1989,40(04):548-552. |
[19] | YANG C C .Electrodeposition of aluminum in molten AlCl3-n-butylpyridinium chloride electrolyte[J].Materials Chemistry and Physics,1994,37(04):335-361. |
[20] | Muhammad Rostom Ali;Atshushi Nishikata;Tooru Tsuru .Electrodeposition of Al-Ni intermetallic compounds from aluminum chloride-N-(n-butyl)pyridinium chloride room temperature molten salt[J].Journal of Electroanalytical Chemistry: An International Journal Devoted to All Aspects of Electrode Kinetics, Interfacial Structure, Properties of Electrolytes, Colloid and Biological Electrochemistry,2001(2):111-118. |
[21] | ALl M R;NISHIKATA A;TSURU T .Electrodeposition of aluminumchromium alloys from AlCl3 -BPC melt and its corrosion and high temperature oxidation behaviors[J].Electrochimica Acta,1997,42(15):2347-2354. |
[22] | M R Ali;A Nishikata;T Tsuru .Electrodeposition of Al-Ti alloys from aluminum chloride-N-(n-butyl)pyridinium chloride room temperature molten salt[J].Indian Journal of Chemical Technology,2003(1):14-20. |
[23] | ALI M R;NISHIKATA A;TSURU T .Electrodeposition of Co-Al alloys of different composition from the AlCl3-BPC-CoCl2 room temperature molten salt[J].Electrochimica Acta,1997,42(12):1819-1828. |
[24] | WIKES J S;LEVISKY J A;WILSON R A et al.Dialkylimidazolium chloroaluminate melts:a new class of room-temperature ionic liquids for electrochemistry spectroscopy and synthesis[J].Inorganic Chemistry,1982,21(03):1263-1264. |
[25] | Lee J-J.;Miller B. .Aluminum Deposition and Nucleation on Nitrogen-Incorporated Tetrahedral Amorphous Carbon Electrodes in Ambient Temperature Chloroaluminate Melts[J].Journal of the Electrochemical Society,2000(9):3370-3376. |
[26] | Mitchell JA.;Hussey CL.;Stafford GR.;Pitner WR. .ELECTRODEPOSITION OF COBALT AND COBALT-ALUMINUM ALLOYS FROM A ROOM TEMPERATURE CHLOROALUMINATE MOLTEN SALT[J].Journal of the Electrochemical Society,1996(11):3448-3455. |
[27] | Qun Zhu;Charles L. Hussey;Gery R. Stafford .Electrodeposition of Silver-Aluminum Alloys from a Room-Temperature Chloroaluminate Molten Salt[J].Journal of the Electrochemical Society,2001(2):C88-C94. |
[28] | Tetsuya Tsuda;Charles L. Hussey;Gery R. Stafford .Electrodeposition of Al-Mo Alloys from the Lewis Acidic Aluminum Chloride-l-ethyl-3-methylimidazolium Chloride Molten Salt[J].Journal of the Electrochemical Society,2004(6):C379-C384. |
[29] | Tetsuya Tsuda;Charles L. Hussey;Gery R. Stafford .Electrochemistry of Titanium and the Electrodeposition of Al-Ti Alloys in the Lewis Acidic Aluminum Chloride-1-Ethyl-3-methylimidazolium Chloride Melt[J].Journal of the Electrochemical Society,2003(4):C234-C243. |
[30] | Pitner WR.;Stafford GR.;Hussey CL. .ELECTRODEPOSITION OF NICKEL-ALUMINUM ALLOYS FROM THE ALUMINUM CHLORIDE-1-METHYL-3-ETHYLIMIDAZOLIUM CHLORIDE ROOM TEMPERATURE MOLTEN SALT[J].Journal of the Electrochemical Society,1996(1):130-138. |
[31] | STAFFORD G R;JOVIC V D;HUSSEY L C .Electrodeposition of Cu-Al alloy and underpotential deposition of Al onto Cu single crystals from a room-temperature chloroaluminate molten salt[J].Materials Science Forum,2000,352:49-56. |
[32] | B. J. Tierney;W. R. Pitner;J. A. Mitchell;C. L. Hussey;G. R. Stafford .Electrodeposition of copper and copper-aluminum alloys from a room-temperature chloroaluminate molten salt[J].Journal of the Electrochemical Society,1998(9):3110-3116. |
[33] | JONES S;BLOMGREN D .Low-temperature molten salt electrolytes based on aralkyl quaternary or ternary onium salts[J].,1989,136(02):424-427. |
[34] | ZHAO Y G;VANDERNOOT T J .Electrodeposition of aluminium from room temperature AlCl3 -TMPAC molten salts[J].Electrochimica Acta,1997,42(11):1639-1643. |
[35] | ABBOTT A P;EARDLEY C A;FARLEY N R S et al.Novel room temperature molten salts for aluminum electrodeposition[J].Trans IMF,1999,77(01):26-28. |
[36] | MOFFATT P .Electrodeposition of Al-Cr metallic glass[J].Journal of the Electrochemical Society,1994,141(09):1115-1117. |
[37] | 孙淑萍,尹彦冰,王兆文,李娟,高炳亮,邱竹贤.钢板熔盐电镀Al-Mn和Al-Ni合金镀层[J].东北大学学报,2000(01):66. |
[38] | 孙淑萍,李娟,王英,褚松竹,杨振海,邱竹贤.Al-Mn-Ce(Ti)合金镀层的研究[J].东北大学学报(自然科学版),1999(04):395-397. |
[39] | 王吉会,张爱平,刘翔,田维静.Al-Mg合金镀层的制备与性能[J].中国有色金属学报,2006(04):575-579. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%