利用化学镀的方法制备了CoWP磁性薄膜.研究了施镀时间对化学镀CoWP薄膜矫顽力和饱和磁化强度的影响,并利用场发射扫描电子显微镜(FSEM)、X射线衍射(XRD)和振动样品磁强计(VSM)研究了CoWP磁性薄膜的表面形貌、成分、微结构及磁学性能.结果表明,化学镀CoWP薄膜主要为hcp结构Co相,晶粒大小为2～3 μm;随着施镀时间的增加,CoWP薄膜的饱和磁化强度也随之增大,最高达到122 emu/g;CoWP薄膜的矫顽力都在250 Oe以下.通过计算Kelly-Hankel(δM)曲线,证实了CoWP磁性薄膜中存在交换耦合作用,产生了剩磁增强效应.
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