欢迎登录材料期刊网

材料期刊网

高级检索

采用硫酸盐溶液体系进行三价铬电镀,获得厚度超过30 μm的铬镀层.分别探讨了ρ(Cr3+)、ρ(添加剂)、ρ(H3BO3)、(φ)(络合剂)和pH对镀液覆盖能力和镀速,电镀时间对镀速和镀层厚度的影响.研究了不同热处理温度下镀层的硬度和表面形貌.通过正交实验获得了最佳工艺条件:144 g/L Na2SO4,50 g/L K2SO4,60~80 g/L硼酸,15 g/L Cr3+,10~15 mL/L络合剂,1.0~1.5 g/L添o6加剂,适量66润湿剂,pH = 2.5~3.0,温度40 °C,电流密度为10~20 A/dm2.在此工艺下,获得了半光亮、银白色的铬镀层,硬度为706 HV.通过200°C热处理后,铬镀层的硬度达到最大值,为1 401 HV.但热处理温度升高,铬镀层表面出现裂纹而影响镀层质量.

参考文献

[1] 屠振密.三价铬电镀机理的研究--铬层不能增厚的原因[J].材料保护,1985(03):14.
[2] EL-SHARIF M;CHISHOLM C U .Characteristics of electrodeposited chromium[J].Transactions of the Institute of Metal Finishing,1997,75(06):208-212.
[3] G. Hong;K.S.Siow;G.Zhiqiang .Hard Chromium Plating From Trivalent Chromium Solution[J].Plating & Surface Finishing,2001(3):69-75.
[4] 曾志翔,王立平,陈丽,张俊彦.三价铬电镀硬铬及镀层性能的研究[J].电镀与环保,2006(04):11-13.
[5] EDIGARYAN A .Chromium plating method[P].US 7052592,2006-05-30.
[6] EL-SHARIF M;MCDOUGALL J;CHISHOLM C U .Electrodeposition of thick chromium coatings from an environmentally acceptable chromium Ⅲ)-glycine complex[J].Trans Inst M4et 4Finish,1999,77(04):139-144.
[7] IBRAHIM S K;WATSON A;GAWNE D T .The role of formic acid and methanol on speciation rate and quality in the electrodeposition of chromium from trivalent electrolytes[J].Transactions of the Institute of Metal Finishing,1997,75(05):181-188.
[8] 胡耀红,陈力格,赵国鹏,刘建平,洪榕.三价铬镀铬阳极的研究[J].材料保护,2006(04):26-28,31.
[9] 胡耀红,陈力格,刘建平.三价铬镀铬工艺及其新型阳极的初步研究[J].电镀与涂饰,2004(02):19-21.
[10] 张新;李惠东;段淑贞 等.三价铬盐镀液电镀厚铬镀层的性能[J].北京科技大学学报,1996,18(02):59-62.
[11] Kwon SC;Kim A;Park SU;Kim DY;Kim D;Nam KS;Choi Y .Characterization of intermediate Cr-C layer fabricated by electrodeposition in hexavalent and trivalent chromium baths[J].Surface & Coatings Technology,2004(2/3):151-156.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%