选择硅酸盐系电解液,用微弧氧化方法在LY12基体上制备了陶瓷层.用扫描电镜、能谱仪等研究了不同氧化时间形成陶瓷层的成分分布和组织变化规律.结果表明:氧化初期,陶瓷层生长主要是疏松层的增厚过程;在60~180min的氧化中期,陶瓷层增厚包括了疏松层生长和致密层生长两个过程,前半段由疏松层向外生长为主,后半段以致密层向基体内部生长为主;氧化后期,两层的生长速率及层厚基本持平,陶瓷层生长速率明显降低.
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