采用非平衡磁控溅射离子镀技术在单晶硅衬底上沉积类石墨碳膜(GLC),研究基体负偏压对GLC膜的组织形貌及性能的影响.结果表明:基体偏压影响镀层表面形貌,-30 V下的镀层表面为较小颗粒状组织;-65 V下的镀层表面均匀致密,无明显颗粒组织;-90 V下的镀层颗粒边界趋于明显;-120 V下的出现大小不均匀的颗粒.沉积速率在-65 V前保持平稳,-90 V时下降为0.25 μm·h-1.随偏压的增加,Ar元素含量先增加后降低.
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