欢迎登录材料期刊网

材料期刊网

高级检索

采用直流磁控溅射技术在玻璃基板上沉积ITO薄膜,通过调整基板温度、薄膜厚度得到了最低方阻1.4Ω/□.薄膜透光率超过76%.对样品在150 kHz到18 GHz频段内电磁屏蔽效能采用屏蔽室法进行测试,1 G频率点得到的屏蔽效能最好,达到了54 dB,在屏蔽困难的低频段,150 kHz频率点的屏蔽效能达到24 dB.

ITO films were prepared by DC magnetron sputtering on glass substrate. By adjusting the substrate temperature and film thickness,minimum sheet resistance 1.4 Ω/□ was obtained, while transmittance beyond 76%. Using shielding room method, electromagnetic shielding effectiveness(SE) of the samples was tested in 150 kHz to 18 GHz frequency bands. Best SE 54 dB was obtained at 1 G frequency. Though electromagnetic in low frequency band was difficult to shield, SE at 150 kHz frequency could still reach 24 dB.

参考文献

[1] 余爱民,赖声礼.抑制计算机信息泄漏的屏蔽技术[J].华南理工大学学报(自然科学版),2004(07):32-35.
[2] 张洪欣,吕英华.电磁信息泄漏技术及其发展[J].安全与电磁兼容,2004(06):39-43.
[3] 张宇民,朱虹,韩杰才,张立刚,胡路阳.电磁屏蔽材料及显示屏应用研究进展[J].材料导报,2006(01):4-8.
[4] 袁林生,沈晓冬,崔升,范凌云.透明屏蔽材料的研究现状及展望[J].兵器材料科学与工程,2007(02):82-84.
[5] 辛荣生,林钰.ITO薄膜的制备及其光电特性研究[J].电子元件与材料,2005(09):39-41.
[6] 周静,刘静.X射线分析温度对ITO膜结构与电性能的影响[J].武汉理工大学学报,2001(09):1-3.
[7] 邱扬;宋雅玲 .镀膜玻璃屏蔽效能计算方法[J].电子计算机与外部设备,1997,21(04):46-49.
[8] Mudryi A V;Ivaniukovich A V et al.Deposition by magnetron sputtering and claaractcrization of indium tin oxide thin films[J].Thin Solid Films,2007,515:6489-6492.
[9] 李雪,刘泰康,姜云.电磁屏蔽技术分析[J].电子工艺技术,2007(01):49-51.
[10] J. L. Huang;B. S. Yau;C. Y. Chen;W. T. Lo;D. F. Lii .The electromagnetic shielding effectiveness of indium tin oxide films[J].Ceramics International,2001(3):363-365.
[11] 李秀荣;刘静.高频电磁屏蔽用ITO膜结构与性能分析[J].
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%