用闭合场非平衡磁控溅射离子镀(CFUBMIP)系统沉积制备CrN硬质薄膜,通过调节偏压改变薄膜沉积过程中离子轰击能量.采用XRD分析薄膜的相结构,结合SEM和AFM对薄膜表面形貌和截面结构的观察,探讨离子轰击能量对CrN硬质薄膜生长方式以及取向的影响规律.结果表明,随着偏压从-60 V增大到-90 V,薄膜始终由CrN单相组成,且均呈柱状生长,但生长择优取向从(200)向(111)转变.偏压的变化主要通过改变离子轰击能量影响薄膜的生长机制,低偏压时以表面能主导,因此呈(200)择优取向生长,而高偏压时以应变诱导生长机制为主,呈(111)择优取向生长.
参考文献
| [1] | Gautier C;Moussaoui H;Elstner F et al.Comparative study of mechanical and structural properties of CrN films deposited by d.c.magnetron sputtering and vacuum arc evaporation[J].Surface and Coatings Technology,1996,86/87:254-262. |
| [2] | Bao Mingdong;Yu Lei;Xu Xuebo .Microstructurc and wear behaviour of silicon doped Cr-N nanoeomposite coatings[J].THIN SOLID FILMS,2009,517:4938-4941. |
| [3] | 吴一平;乔学亮;陈建国.多弧离子沉积(Ti,Al)N薄膜的结构和形貌[J].机械工程材料,1995(04):29-31. |
| [4] | Mattox D M .Surface effects on the growth,adhesion and prop erties of reactively deposited hard coatings[J].Surface and Coatings Technology,1996,81:8-16. |
| [5] | Inoue S;Uchida H;Hioki A et al.Structure and composition of(Ti,Al)N films prepared by r.f.planar magnetron sputtering using a composite target[J].THIN SOLID FILMS,1995,271:15-18. |
| [6] | Olaya JJ;Rodil SE;Muhl S;Huerta L .Influence of the energy parameter on the microstructure of chromium nitride coatings[J].Surface & Coatings Technology,2006(20/21):5743-5750. |
| [7] | Jung MJ.;Nam KH.;Jung YM.;Han JG. .Nucleation and growth behavior of chromium nitride film deposited on various substrates by magnetron sputtering[J].Surface & Coatings Technology,2003(1/3):59-64. |
| [8] | Fornies E;Galindo RE;Sanchez O;Albella JM .Growth of CrNx films by DC reactive magnetron sputtering at constant N-2/Ar gas flow[J].Surface & Coatings Technology,2006(20/21):6047-6053. |
| [9] | Mckenzie D R;Yin Y;Mcfall W D et al.The orientation dependence of elastic strain energy in cubic crystalsand its application to preferred orientation in titanium nitrides thin films[J].Journal of Physics,1996,32:5883-5890. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%