采用磁控溅射方法制备Ni纳米颗粒,使用扫描电镜(SEM).原子力显微镜(AFM)等表征其形貌结构.采用高压溅射喷嘴结构,研究改变溅射压力等工艺参数对Ni纳米颗粒尺寸与形貌的影响.实验表明,采用高压喷嘴结构,溅射压力为20-180 Pa之间可以获得尺寸为10-100 nm的Ni纳米颗粒.采用高压溅射喷嘴结构可以得到具有晶体结构特征的Ni纳米颗粒.
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