为了制备难以直接获得的金属相SmS,以Sm和Sm2S3为靶材,采用双靶子溅射系统,于单晶Si基板上直接获得了常温常压下稳定存在的M-SmS微晶薄膜,并采用XRD分析、内应力和RBS成分测试等手段对M-SmS的形成机理进行了研究.结果表明:M-SmS薄膜的形成是由于薄膜中存在压应力,压应力的形成与薄膜基板温度、薄膜沉积速率、薄膜中Sm元素过量以及基板之间膨胀系数的差异有关.
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