影响金属薄膜沉积初期因素的有限单元法模拟

1.昆明理工大学,材料与冶金工程学院,云南,昆明,650093

2.昆明理工大学,材料与冶金工程学院,云南,昆明,650093

3.昆明理工大学,材料与冶金工程学院,云南,昆明,650093

4.昆明理工大学,材料与冶金工程学院,云南,昆明,650093

5.昆明贵金属研究所,云南,昆明,650221

基金项目: 国家自然科学基金(50001003)

Finite element method simulation of affecting factors during metal thin film deposition

利用有限单元法对影响金属薄膜沉积初期的因素进行了计算机模拟.按膜料为Pt、Pt-Ru、Pt-Ti、Pt-Ni、Pt-Al等五种模式,采用刚性球入射到C或Si基底,重点研究了沉积原子的半径差异比、沉积原子能量和原子入射角等参数对薄膜沉积的影响,同时检验了有限元方法在微观领域中的合理性和适用性.

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