为探索电子束物理气相沉积(EB-PVD)制备YSZ涂层的显微组织结构特征,采用大功率EB-PVD设备制备了20 μm厚的YSZ涂层.分别利用X射线荧光光谱(XRF)和X射线衍射(XRD)技术分析了涂层的化学成分和物相组成,并进一步采用X射线面探扫描技术对涂层的织构进行了表征.分析结果表明,涂层材料具有典型的立方萤石型结构,且表现出择优取向特征,空气气氛中1273 K退火前后XRD峰位的偏移以及退火后O元素沿断面的浓度分布均表明制备过程中在涂层的晶格内形成了额外的氧空位.
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