测试了硫酸盐还原菌(sulfate reducing bacteria,SRB)的生长规律,浸泡初期(前 3d)SRB处于对数增长期,浸泡后期(4 d后)SRB进入稳定生长期.利用AFM技术和EIS电化学方法研究了SRB生物膜对HSn70-1AB铜合金电极界面的影响.AFM分析表明,浸泡后期合金表面生物膜粗糙度较前期有所下降.EIS结果表明,浸泡前3 d,合金表面氧化膜层较为稳定,氧化膜层电容值变化不明显.浸泡7 d后,合金表面氧化膜遭受局部腐蚀,开始出现微孔,粗糙度增加,氧化膜层电容值增大.
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