利用液相反应烧结制备不同配比的Mo-Si复合材料,用X射线分析相组成,扫描电镜观察微观组织形貌,热膨胀仪测不同块体材料的热膨胀系数(CTE).研究结果表明,不同配比烧结体相组成以MoSi2为主,当Si/Mo为2.2:1(at%)时MoSi2基体中仍含有极少量的Mo5Si3相,而Si/Mo为2.3:1时生成纯MoSi2.复合材料的CTE随Mo5Si3相含量的减少而增加,当Si/Mo达到2.3:1时,CTE为最大值(8.16×10-6K-1).
参考文献
[1] | 马勤.二硅化钼--用途广泛的金属间化合物[J].材料开发与应用,1997(06):27. |
[2] | VASUDEVAN A K;PETROVIC J .Comparative overview of molybdenum disilicide composites[J].Journal of Materials Science,1990,25:4453-4456. |
[3] | PERIO A .Growth of MoSi2 with preferential orientation on(100) silicon[J].Applied Physics Letters,1984,45(08):857-859. |
[4] | 曾燮榕;郑长卿 .碳-碳复合材料MoSi2涂层的防氧化研究[J].复合材料学报,1997,14(03):37-40. |
[5] | 肖来荣,易丹青,殷磊,李洪武.铌及铌合金高温涂层研究进展[J].材料导报,2004(01):13-15. |
[6] | 《难熔金属论文集》编辑组.难熔金属及其合金的防护涂层[M].上海:上海科学技术情报研究所,1974 |
[7] | JIN-KOOK YOON;GYEUNG-HO KIM .Simultaneous growth mechanism of intermediate silicides in MoSi2/Mo system[J].Surface and Coatings Technology,2001,148:129-135. |
[8] | MITRA R;MAHAJAN Y R .Processing-microstructureproperty relationships in reaction hot-pressed MoSi2 and MoSi2/SiCp composites[J].Materials Science and Engineering A,1997,A225:105-117. |
[9] | Deevi SC.;Thadhani NN. .REACTION SYNTHESIS OF HIGH-TEMPERATURE SILICIDES[J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,1995(0):604-611. |
[10] | JO S W;LEE G W;Kim Y S .On the formation of MoSi2 by self-propagating high-temp[J].Synthesis Acta Mater,1996,44(11):4317-4326. |
[11] | 来忠红,朱景川,王丽艳,尹钟大.原位复合Mo-Si化合物材料的相组成和力学性能[J].材料科学与工艺,2003(03):248-250,253. |
[12] | 美国国家材料咨询委员会;金石.高温抗氧化涂层[M].北京:科学出版社,1980:38-39. |
[13] | 师昌绪;李恒德;周廉.材料科学与工程手册[M].北京:化学工业出版社,2004 |
[14] | CHOE H;HSIEH T .The effect of powder processing on the coefficient of thermal expansion of MoSi2-Si3N4 composites[J].Materials Science and Engineering A,1997,A237:250-255. |
[15] | CHU F;THOMA D J .Synthesis and properties of Mo5Si3single crystals[J].Intermetallics,1997,7:611-620. |
[16] | Takimoto K.;Fukuta A.;Yamamoto Y.;Yoshida N.;Itoh T.;Nonomura S. .Linear thermal expansion coefficients of amorphous and micro crystalline silicon films[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2002(Pt.1):314-317. |
[17] | Takimoto K.;Fukuta A.;Yamamoto Y.;Yoshida N.;Itoh T.;Nonomura S. .Linear thermal expansion coefficients of amorphous and micro crystalline silicon films[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2002(Pt.1):314-317. |
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