以PTES和APS为硅源,在TEAOH的催化作用下采用水解共缩合法合成了二元胺POSS,经FTIR、1H-NMR,13C-NMR,29Si-NMR测试表明,产物具有设计的理想结构.将合成的二元胺POSS与ODA一并与PMDA反应得到二元胺POSS修饰的聚酰胺酸,经热酰亚胺化后得到了一系列不同二元胺POSS含量的聚酰亚胺杂化薄膜.利用TGA、微机控制拉力试验机、等离子体原子氧产生装置分别对杂化薄膜的热性能、力学性能、抗原子氧侵蚀性能进行了研究.结果表明,杂化薄膜耐热性良好,但力学性能有所降低,当二元胺POSS的摩尔百分含量达到7％时,杂化薄膜的抗原子氧性能提高了将近4倍.
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