应用弱极化区三点法和线性极化法对钽及表面离子渗氮层在10%NaOH中的腐蚀电流和极化电阻进行了测量,给出了腐蚀电流与离子渗氮工艺之间的回归方程.
参考文献
| [1] | 张德元,李放,罗文,蔡莉,许兰萍,林勤.钽等离子体渗氮的表面过程分析[J].中国有色金属学报,2000(02):189. |
| [2] | HASHIMOTO K;Kumagai N;Yoshioka H et al.Corrosion-resistant amorphous surface alloys[J].Corrosion Science,1993,34:363-370. |
| [3] | Kim J H;Akiyama E;Habazaki H et al.An XPS study of the corrosion behavior of sputter - deposited amorphous Cr-Nb and Cr-Ta alloys in 12M HCl solution[J].Corrosion Science,1994,35:511-523. |
| [4] | Shimizu K;Brown G M;Habazaki H et al.Direct observation of anodic films formed on tantalum concentrated phosphoric and sulphuric acid solution[J].Corrosion Science,1998,40(06):963-973. |
| [5] | Gad-allah A G;el-rahman H A Abd .Kinetics of open-circuit barrier layer formation on metallic surfaces in aqueous solutions[J].CORROSION,1987,43(11):698-702. |
| [6] | Uehara I;Sakai T;Ishikawa H et al.The corrosion behavior of tantalum and niobium in hydrobromic acid solutions[J].Corrosion,1986,42(08):492-498. |
| [7] | Robin A;Almeida M E de;Nunes C A .Corrosion behavior of niobium and Nb-25wt% Ta alloy in sulfuric acid solutions[J].Corrosion,1991,47(06):443-448. |
| [8] | 李建萍 .钽的氮离子注入法研究[J].航空工艺技术,1995,2:60-64. |
| [9] | Masaitis R L.X-ray characterization of oxidized tantalum nitride[A].Phoenix Arizona USA 13-18,1991:348-353. |
| [10] | 张德元,林勤,曾卫军,李放,许兰萍,付青峰.Diffusion kinetics of nitrogen in tantalum during plasma-nitriding[J].中国有色金属学会会刊(英文版),2001(02):278-280. |
| [11] | 吴荫顺.金属腐蚀研究方法[M].北京:冶金工业出版社,1993:48. |
| [12] | 刘永辉.电化学测试技术[M].北京:北京航空学院出版社,1987:366. |
| [13] | L Eckertová;王广阳.薄膜物理学[M].北京:科学出版社,1986:13. |
| [14] | 姚守拙;朱元宝;何双娥.元素的化学反应手册[M].长沙:湖南教育出版社,1998:1064. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%