本文报道了采用RF磁控溅射制备出了高性能的Fe-N薄膜,膜厚约200nm,磁场热处理后薄膜中含有α′和少量γ′,具有优质的软磁性能,饱和磁化强度2.4T,高于纯铁的,矫顽力小于80A/m,2～10MHz下的磁导率为1500.然后提出一个模型,合理的解释了磁场热处理后薄膜表面的各向异性现象,包括不同方向的磁滞回线,剩磁比,矫顽力等.
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