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以正硅酸乙酯(TEOS)和γ-(甲基丙稀酰氧)丙基三甲氧基硅烷(MEMO)为前驱体,在聚酰亚胺基底上制备了氧化硅涂层,采用扫描电镜(SEM)、傅里叶红外衰减全反射光谱(FTIR-ATR)和X光电子能谱(XPS)对其表面形貌、结构和成分进行了分析.结果表明MEMO的加入增加了氧化硅涂层的韧性,并赋予其憎水性能,表面化学成分由MEMO以及TEOS+MEMO的水解和缩聚过程决定.用地面模拟设备对氧化硅涂层进行原子氧暴露试验,结果表明其具有很好的防原子氧性能,使基体原子氧侵蚀速率下降了一个数量级.

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