欢迎登录材料期刊网

材料期刊网

高级检索

通过双层辉光等离子表面合金化方法,在C/C复合材料表面成功制得铱涂层,并研究了铱涂层相组成和微观结构.铱涂层呈亮银白色,致密且表面光滑均匀,无明显缺陷.XRD和SEM研究表明:铱涂层呈多晶态,晶粒呈簇柱状晶并与C/C复合材料表面垂直,具有嵌入式结构,晶粒平均直径为0.5 um,铱涂层截面呈现明显的柱状晶生长,涂层内部有少量裂纹和针孔但并未贯穿.

参考文献

[1] Strife J R;Sheehan J E .Ceramic coatings for carboncarbon composites[J].Ceramic Bulletin,1988,67(02):369-374.
[2] 华云峰,陈照峰,张立同,成来飞.MOCVD Ir薄膜的制备与沉积效果分析[J].稀有金属材料与工程,2005(01):139-142.
[3] 王洒颖.化学元素[M].贵阳:贵州人民出版社,1987:25-42.
[4] Merker J;Eehigoya J.Investigation of mierostructure-property relationships in iridium,metal[A].Iridium.Nashville,2000:109-119.
[5] Tuffias R H;Williams B E;Kaplan R B .[P].US 5855828,1999.
[6] Tuffias R H;Williams B E;Kaplan R B .[P].US 5855828,1999.
[7] Gelfond N V;Tuzikov F V;Igumenov I K .An XPS study of the composition of iridium films obtained by MOCVD[J].Surface Science,1992,275:323-331.
[8] Goto T;Vargss J R;Hirai T .Preparation of iridium clusters by MOCVD and their electrochemical properties[J].Materials Science and Engineering A:Structural Materials Properties Microstructure and Processing,1996,217-218:223-226.
[9] Smith D C;Pattillo S G;Zocco T G et al.Low-temperature chemical vapor deposition of rhodium and iridium thin films[J].Materials Research Society Symposium Proceedings,1990,168:369-377.
[10] Maury F.;Senocq F. .Iridium coatings grown by metal-organic chemical vapor deposition in a hot-wall CVD reactor[J].Surface & Coatings Technology,2003(0):208-213.
[11] Sun Y M;Endle J P;Smith K et al.Iridium film growth with iridium tris-acetylacetomate:oxygen and substrate effects[J].Thin Solid Films,1999,346:100-107.
[12] Mumtaz K;Echigoya J;Hiral T et al.R magnetron sputtered iridium coatings on carbon structural materials[J].Materials Science and Engineering A,1993,167:187-195.
[13] Mumtaz K;Echigoya J;Hirai T et al.Iridium coatings on carbon-carbon composites produced by two different sputtering methods:a comparative study[J].Journal of Materials Science Letters,1993,12:1411-1417.
[14] Harding J T;Fry V R;Tuffias R H.Oxidation resistance of CVD coatings[M].Air Force Rocket Propulsion Laboratory(AFRPL),Edwards Air Force Base,CA,1987:29.
[15] 徐重.等离子表面冶金技术的现状与发展[J].中国工程科学,2002(02):36-41.
[16] 徐重,张高会,张平则,张艳梅,池成忠,袁庆龙.双辉等离子表面冶金技术的新进展[J].中国工程科学,2005(06):73-78.
[17] Bauer E .Epitaxy of metals on metals[J].Applied Surface Science,1982,11-12:479-494.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%