讨论了在低温条件下制备的ZnO:Al薄膜的结构、表面形貌和光电特性,对聚酰亚胺(Polvimide,PI)和玻璃两种不同衬底的薄膜进行了比较研究.两种不同衬底的薄膜均为多晶膜,具有六角纤锌矿结构,最佳取向均为(002)方向,衬底温度从室温到210℃时,制备的薄膜密度变化范围为4.6～5.16 g/cm3.在柔性衬底和玻璃衬底上制备的薄膜最低电阻率分别为5.3×10-4Ω·cm和5.1×10-4Ω·cm,薄膜在可见光区的平均透过率分别达到了72%和85%,讨论了两种衬底薄膜电学特性的稳定性.
参考文献
| [1] | Zhang D H, Yang T L, Ma J, et al. Preparation of transparent conducting ZnO : Al films on polymer substrates by r. f. magnetron sputtering[J]. Applied Surface Sciences, 2000, 158 (1): 43-48. |
| [2] | Minami T, Sonohara H, Takata S, et al. Highly transparent and conductive zinc-stannate thin films prepared by r.f. magnetron sputtering[J]. Jpn. J. Appl. Phys., 1994, 33(2) :L1693-1696. |
| [3] | Sieber I, Wanderka N, Urban I, et al. Electron microscopic characterization of reactively sputtered ZnO films with different Al-doping levels[J]. Thin Solid Films, 1998, 330(2) .. 108-113. |
| [4] | Park K C, Ma D Y, Kim K H. The physical properties of Al-doped zinc oxide films prepared by r. f. magnetron sputtering[J]. Thin Solid Films, 1997, 305(1) :201-209. |
| [5] | 赵俊卿,解士杰,韩圣浩,等.柔性OLED制备和失效机制研究[J].发光学报,2000,21(suppl.):126-129. |
| [6] | Yang T L, Zhang D H, Ma J, et al. Transparent conducting ZnO : Al films deposited on organic substrates deposited by r. f. magnetron-sputtering[J]. Thin Solid Films, 1998, 326(1): 60-62. |
| [7] | 杨田林,张德恒,李滋然,等.磁控溅射制备的柔性衬底ZnO:Al透明导电薄膜的研究[J].太阳能学报,1999,20(2):200-204. |
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