介绍了液相合成的碳纳米带的场致电子发射特性,探索其在场发射中的应用.碳纳米带的合成采用电化学液相合成的方法在硅衬底上制备而成.通过扫描电镜和Raman光谱对碳纳米带的结构进行了分析.场发射特性测试结果表明,碳纳米带膜的场发射阈值电场为2.5 V/μm.研究表明碳纳米带具有一些独到的特点,也非常适合场发射显示用冷阴极的制备.研究纳米石墨带薄膜的场发射特性对其在场发射显示器件和其他真空微电子器件中的应用有重要的意义.
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