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与蓝宝石衬底相比,硅衬底具有低成本、大面积、高质量、导电导热性能好等优点,普遍认为使用Si片作GaN薄膜衬底有可能实现光电子和微电子的集成,因此Si基GaN的研究受到了广泛关注.本文回顾了Si衬底GaN基LED的研究进展, 同时简要介绍了在Si衬底上制备GaN基LED的实验结果,及研制出工作电压为3.6 V、串联电阻为31 Ω、输出功率近1 mW的Si衬底GaN基蓝光LED.

参考文献

[1] Nakamura S, Fasol S, Pearton S. The Blue Laser Diode: The Complete Story[M]. Second Revised. New York: Springer, 2000.335-336.
[2] 张书明, 杨辉, 段俐宏, 等. 氮化镓基蓝、绿光LED中游工艺技术产业化研究[J]. 液晶与显示,2003,18(1):44-47.
[3] 陈志忠, 秦志新,胡晓东,等.大功率白光LED的制备和表征[J]. 液晶与显示,2004,19(2):83-86.
[4] Krost A, Dadgar A. GaN-based optoelectronics on silicon substrates[J]. Mater. Scie. and Eng. B, 2002,93: 77-84.
[5] Manasevit H M, Erdmann F M, Simpson W I. The use of metalorganics in the preparation of semiconductor materials: IV. The nitrides of aluminium and gallium[J].J. Electrochem. Soc. ,1971, 118:1864-1868.
[6] Guha S, Bojarczuk N A. Ultraviolet and violet GaN light emitting diodes on silicon[J]. Appl.Phys.Lett., 1998, 72(4):415-417.
[7] Strittmatter A, Krost A, Straburg M, et al. Low-pressure metal organic chemical vapor deposition of GaN on silicon(111) substrates using an AlAs nucleation layer[J]. Appl. Phys. Lett., 1999, 74 (9): 1242-1244.
[8] Kobayashi N P, Kobayashi J T, Dapkus P D, et al. GaN growth on Si(111) substrate using oxidized AlAs as an intermediate layer[J]. Appl. Phys. Lett., 1997, 71 (24):3569-3571.
[9] Yang J W, Sun C J, Chen Q, et al. High quality GaN-InGaN heterostructures grown on (111) silicon substrates[J]. Appl. Phys. Lett., 1996, 69 (23):3566-3568.
[10] Nikishin S A, Faleev N N, Antipov V G, et al. High quality GaN grown on Si(111) by gas source molecular beam epitaxy with ammonia[J]. Appl. Phys. Lett., 1999, 75 (14): 2073-2075.
[11] Schenk H P D, Kipshidze G D, Lebedev V B, et al. Epitaxial growth of AlN and GaN on Si(111) by plasma-assisted molecular beam epitaxy[J]. J.Cryst. Grow., 1999, 201/202: 359-364.
[12] Semond F, Damilano B, Vezian S, et al. GaN grown on Si(111) substrate: From two-dimensional growth to quantum well assessment[J]. Appl. Phys. Lett., 1999, 75 (1): 82-84.
[13] Rinaldi R, Antonaci S, Anni M, et al. Morphological and optical characterization of GaN/AlN heterostructures grown on Si(111) substrates by MBE [J].Phys. Stat. Sol. (B), 1999, 216(1): 701-706.
[14] Calleja E, Sanchez-Garcia M A, Sanchez F J,et al. Growth of III-nitrides on Si(111) by molecular beam epitaxy doping, optical, and electrical properties [J]. J. Cryst. Grow., 1999, 201/202: 296-317.
[15] Ishikawa H, Zhao G Y, Nakada N, et al. High-quality GaN on Si substrate using AlGaN/AlN intermediate layer[J]. Phys. Stat. Sol. (a), 1999, 176(1): 599-603.
[16] Lee W, Park W S W, Yoo J B. The application of a low temperature GaN buffer layer to thick GaN film growth on ZnO/Si substrate [J].Phys. Stat. Sol. (a), 1999, 176(1): 583-587.
[17] Ishikawa H, Yamamoto K, Gawa T E, et al. Thermal stability of GaN on (111) Si substrate[J]. J. Cryst. Grow., 1998, 189/190: 178-182.
[18] Wang D, Hiroyama Y, Tamura M, et al. Heteroepitaxial growth of cubic GaN on Si(001) coated with thin flat SiC by plasma-assisted molecular-beam epitaxy[J]. Appl. Phys. Lett., 2000, 76 (13): 1683-1685.
[19] Liaw H M, Venugopal R, Wan J, et al. GaN epilayers grown on 100 mm diameter Si(111) substrates[J]. Solid-State Electronics, 2000, 44: 685-690.
[20] Liaw H M, Doyle R, Fejes P L, et al. Crystallinity and microstructures of aluminum nitride films deposited on Si(111) substrates[J]. Solid-State Electronics, 2000,44: 747-755.
[21] Hellman E S, Buchanan D N E, Chen C H. Nucleation of AlN on the (7x7) reconstructed silicon (111) surface[J/OL]. MRS Internet J. Nitride Semicond. Res., 3,43.(1998).
[22] Lahré che H, Vennéguès P,Tottereau O,et al. Optimisation of AlN and GaN growth by metalorganic vapour-phase epitaxy (MOVPE) on Si(111)[J]. J. Cryst.Grow., 2000, 217: 13-25.
[23] Zamir S, Meyler B, Zolotoyabko E, et al. The effect of AlN buffer layer on GaN grown on (111)-oriented Si substrates by MOCVD[J]. J. Cryst. Grow., 2000,218:181-190.
[24] Follstaedt D M, Han J, Provencio P, et al. Microstructure of GaN grown on (111) Si by MOCVD[J/OL].MRS Internet J. Nitride Semicond. Res., 4S1, G3.72. (1999).
[25] Dadgar A, Bl(a)sing J, Diez A, et al. Metalorganic chemical vapor phase epitaxy of crack-free GaN on Si(111) exceeding 1μm in thickness[J]. Jpn.J.Appl.Phys., 2000, 39(11B): L1183-L1185.
[26] Reiher A, Bl(a)sing J, Dadgar D, et al. Efficient stress relief in GaN heteroepitaxy on Si(111) using low-temperature AlN interlayers[J]. J.Cryst. Growth, 2003, 248: 563-567.
[27] Marchand H, Zhao L, Zhang N, et al. Metalorganic chemical vapor deposition of GaN on Si(111): Stress control and application to field-effect transistors[J]. J. Appl. Phys., 2001, 89: 7846-7851.
[28] Ishikawa H, Zhao G Y, Nakada N, et al. GaN on Si substrate with AlGaN/AlN intermediate layer[J]. Jpn. J. Appl. Phys., 1999,38(5A): L492-L494.
[29] Kim M H, Do Y G, Kang H C, et al. Effects of step-graded Al xGa1- xN interlayer on properties of GaN grown on Si(111) using ultrahigh vacuum chemical vapor deposition[J]. Appl. Phys. Lett., 2001,79(17): 2713-2715.
[30] Egawa T, Zhang B, Nishikawa N, et al. InGaN multiple-quantum-well green light-emitting diodes on Si grown by metalorganic chemical vapor deposition[J]. J.Appl.Phys., 2002, 91(1): 528-530.
[31] Feltin E, Beaumont B, Laügt M, et al. Crack-free thick GaN layers on silicon(111) by MOVPE[J]. Phys.Stat.Sol.(a), 2001, 188(2): 531-536.
[32] Honda Y, Kuroiwa Y, Yamaguchi M,et al.Growth of GaN free from cracks on a (111)Si substrate by selective metalorganic vapor-phase epitaxy[J]. Appl.Phys.Lett., 2002, 80(2): 222-224.
[33] Tran C A, Osinski A, Karlicek R F, et al. Growth of InGaN/GaN multiple-quantum-well blue light-emitting diodes on silicon by metalorganic vapor phase epitaxy[J]. Appl.Phys.Lett., 1999, 75(11): 1494-1496.
[34] Yang J W, Lunev A, Simin G, et al. Selective area deposited blue GaN-InGaN multiple-quantum well light emitting diodes over silicon substrates[J]. Appl.Phys.Lett., 2000, 76(3): 273-275.
[35] Adachi M, Nishikawa N, Ishikawa H, et al. Fabrication of light emitting diodes with GaInN multi-quantum wells on Si(111) substrate by MOCVD[A]. IPAP Conf.Series 1[C]. 2000. 868-872.
[36] Feltin E,Dalmasso S, de Mierry P, et al. Green InGaN light-emitting diodes grown on silicon (111) by metalorganic vapor phase epitaxy[J]. Jpn. J. Appl. Phys., 2001, 40(7B): L738-L740.
[37] Egawa T, Moku T, Ishikawa H,et al. Improved characteristics of blue and green InGaN-based light-emitting diodes on Si grown by metalorganic chemical vapor deposition[J]. Jpn.J.Appl.Phys., 2002, 41(6B): L663-L664.
[38] Zhang B J, Egawa T, H.Ishikawa, et al. High-bright InGaN multiple-quantum-well blue light-emitting diodes on Si(111) using AlN/GaN multilayers with a thin AlN/AlGaN buffer layer[J]. Jpn.J.Appl.Phys., 2003, 42(3A): L226-L228.
[39] Dadgar A, Christen J, Riemann T. et al. Bright blue electroluminescence from an InGaN/GaN multiquantum-well diode on Si(111):Impact of an AlGaN/GaN multiplayer[J]. Appl.Phys.Lett., 2001, 78(15): 2211-2213.
[40] Dadgar A, Alam A,Riemann T, et al.Crack-free InGaN/GaN light emitters on Si(111)[J]. Phys.Stat.Sol.(a), 2001, 188(1):155-158.
[41] Dadgar A, Poschenrieder M, Contreras O, et al. Bright,crack-free InGaN/GaN light emitters on Si(111)[J]. Phys.Stat.Sol.(a), 2002, 192(2): 308-313.
[42] Dadgar A, Poschenrieder M, Bl(a)sing J, et al. MOVPE growth of GaN on Si(111) substrates[J]. J.Cryst.Grow., 2003, 248: 556-562.
[43] Stevenson Richard. Substrates and epitaxial growth dominate ECSCRM discussions [EB/OL].http://compoundsemiconductor.net/articles/magazine/10/11/2/2,2004-11.
[44] 莫春兰,方文卿,刘和初,等.硅衬底InGaN多量阱材料生长及LED研制[J]. 高技术通讯,2005,15(5):58-61.
[45] Dadgar A, Poschenrieder M, Reiher A, et al. Reduction of stress at the initial stages of GaN growth on Si(111)[J]. Appl.Phys.Lett., 2003, 82(1): 28-30.
[46] B(o)ttcher T, Einfeldt S, Figge S, et al. The role of high-temperature island coalescence in the development of stresses in GaN films[J]. Appl.Phys.Lett., 2001, 78(14): 1976-1978.
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