欢迎登录材料期刊网

材料期刊网

高级检索

采用干冰微粒喷射法对ITO玻璃表面进行了清洁处理,并与浸泡式低频超声波湿法清洗的ITO玻璃进行了对比测量,结果表明:干冰微粒喷射法处理后,ITO薄膜表面的接触角减小,表面污染物颗粒数量下降,ITO薄膜表面上碳的含量较之未处理时降低了48.5%,锡、铟的含量分别增加了533.33%和267.57%,说明干冰微粒法对ITO薄膜表面的有机污染物和杂质颗粒的清洗效果超过了超声波湿法.此后,制备了干冰微粒法清洗ITO阳极的有机电致发光器件(OLED)器件,以及结构相同但ITO电极是用超声波湿法清洗的OLED器件,对这两种器件的参数进行了测量,其结果表明:干冰微粒喷射法清洗器件的启亮电压、亮度和电流效率与超声波湿法清洗的相比较均有所改善.

参考文献

[1] Hung L S,Chen C H.Recent progress of molecular organic electroluminescent materials and devices[J].Material Science Engineering R,2002,39(5):143-222.
[2] 邵作叶,郑喜风,陈宇.平板显示器中的OLED[J].液晶与显示,2005,20(1):52-56.
[3] Osada T,Kugler T,Broms P,et al.Polymer-based light-emitting devices:investigations on the role of the indiumtin oxide (ITO) electrode[J].Synth.Met.,1998,96(1):77-80.
[4] Kim H,Gilmore C M,Pique A,et al.Electrical,optical,and structural properties of indium-tin-oxide thin films for organic light-emitting devices[J].Appl.Phys.,1999,86(11):6451-6461.
[5] 翟琳,仲飞,刘彭义.磷酸处理ITO基底对有机发光二极管性能的改善[J].液晶与显示,2006,21(5):451-455.
[6] Ganzorig Chimed,Kwak Kwang-Joo,Yagi Kazuto,et al.Fine tuning work function of indium tin oxide by surface molecular design:Enhanced hole injection in organic electroluminescent devices[J].Appl.Phys.Lett.,2001,79(2):272-274.
[7] Liu J M,Lu P Y,Weng W K.Studies on modifications of ITO surfaces in OLED devices by Taguchi methods[J].Material Science Engineering B,2001,85(2):209-211.
[8] Nuesch F,Forsy E W,Le Q T.Importance of indium tin oxide surface acido basicity for charge injection into organic materials based light emitting diodes[J].Appl.Phys.,2000,87(11):7973-7980.
[9] Lu Huei-Tzong,Yokoyama Meiso.Plasma preparation on indium-tin-oxide anode surface for organic light emitting diodes[J].Crystal Growth,2004,260(1-2):186-190.
[10] 张麦丽,王秀峰,牟强,等.1ITO玻璃光刻工艺的研究[J].液晶与显示,2005,20(1):22-26.
[11] Chan I-Min,Hong Franklin C.Improved performance of the single-layer and double-layer organic light emitting diodes by nickel oxide coated indium tin oxide anode[J].Thin Solid Films,2004,450(2):304-311.
[12] 刘陈,朱光喜,刘德明.氧等离子体处理对ITO薄膜表面性能的影响[J].液晶与显示,2006,21(4):309-313.
[13] Sherman Robert,Adams Paul.Carbon dioxide snow cleaning-The next generation of clean[C]//Precision Cleaning'95 Proceedings,Chicago,USA:Precision Cleaning'95 Proceedings Organizing Committee,1995:271-300.
[14] Yang Sheng-Chung,Huanga Keng-Shiang,Lin Yu-Cheng.Optimization of a pulsed carbon dioxide snow jet for cleaning CMOS image sensors by using the Taguchi method[J].Sensorsand Actuators A:Physical,2007,39(1-2):265-271.
[15] 方景礼.金属材料抛光技术[M].北京:国防工业出版社,2005:288.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%