利用光刻技术和湿法刻蚀技术制备ITO透明电极,借助视频显微仪和台阶仪观测电极形状和表面形貌.比较了不同溶液的刻蚀效果,指出采用盐酸加三氯化铁溶液刻蚀效果最佳,分别讨论了HCl含量和ReCl3含量变化对ITO膜刻蚀速率的影响.最后指出在25士2℃的环境下,刻蚀液HCl、H20和FeCl3·6H2O的配比满足3 L:1 L:(20～30 g)时,ITO膜的刻蚀速率能达到1 nm/s,所制备的透明电极边缘整齐无钻蚀,适合于制备平板显示器中的透明精细电极.
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