HTM技术中细微图形成形效果的衍射理论分析与实验结果

液晶与显示 , 2008, 23(3): 327-333. doi: 10.3969/j.issn.1007-2780.2008.03.014

HTM技术中细微图形成形效果的衍射理论分析与实验结果

郭建 ^1, , 金基用 ^2, , 林承武 ^3, , 明星 ^4, , 周伟峰 ^5, , 李斗熙 ^6,

1.北京京东方光电科技有限公司,北京,100176

2.北京京东方光电科技有限公司,北京,100176

3.北京京东方光电科技有限公司,北京,100176

4.北京京东方光电科技有限公司,北京,100176

5.北京京东方光电科技有限公司,北京,100176

6.北京京东方光电科技有限公司,北京,100176

关键词：半色调掩膜 , 灰色调掩膜 , 薄膜晶体管液晶显示器 , 曝光 , 衍射

Analysis and Experiment Result of Diffraction and Interference Phenomenon in Halftone Mask Fine Pattern Forming Process

Keywords： halftone mask , gray tone mask , TFT LCD , exposure , diffraction

针对使用半色调掩膜技术的TFT LCD玻璃基板曝光过程中的衍射和干涉现象进行了分析.文中给出了衍射和干涉现象的理论模型,并且对这两种现象在HTM技术中所起的作用进行了解释,尤其针对不同的狭缝宽度和狭缝间距的结构进行了分析.给出了扫描电镜的图片做为进一步的说明.

Diffraction and interference phenomenon in the halftone mask fine pattern forming process was analyzed.The theoretical model of diffraction and interference was brought forward firstly and its effect at different HTM pattern forming process was explained,especially the patterns with various slit length and intervals.SEM graphs were also provided for the further demonstration.

参考文献

[1]	Zhao Dazun,Zhang Huaiyu.Wave Optics[M].Beijing:Beijing Institute of Technology,1986:100-148.
[2]	An Liansheng.Applied Optics[M].Beijing:Beijing Institute of Technology,2002:14-49.
[3]	Toshihisa Tsukada.TFT/LCD Liquid-Crystal Displays Addressed by Thin-Film Transistors[M].London:Gordon and Breach Publishers,1996:4-95.

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